Inventor
ZABLE HAROLD ROBERT
US27 patents
⚠️ This page may combine multiple inventors who share the name “ZABLE HAROLD ROBERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
D2S INC
20 patentsUS10444629B2Oct 15, 2019
Bias correction for lithography
D2S INC11 citations84
US9625809B2Apr 18, 2017
Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
D2S INC5 citations84
US9372391B2Jun 21, 2016
Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
D2S INC10 citations84
US8017286B2Sep 13, 2011
Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
D2S INC12 citations84
US7985514B2Jul 26, 2011
Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots
D2S INC12 citations84
US11062878B2Jul 13, 2021
Method and system for determining a charged particle beam exposure for a local pattern density
D2S INC5 citations83
US10748744B1Aug 18, 2020
Method and system for determining a charged particle beam exposure for a local pattern density
D2S INC5 citations83
US10460071B2Oct 29, 2019
Shaped beam lithography including temperature effects
D2S INC4 citations72
US11756765B2Sep 12, 2023
Method and system for determining a charged particle beam exposure for a local pattern density
D2S INC2 citations71
US11126085B2Sep 21, 2021
Bias correction for lithography
D2S INC0 citations62
US11592802B2Feb 28, 2023
Method and system of reducing charged particle beam write time
D2S INC0 citations61
US10884395B2Jan 5, 2021
Method and system of reducing charged particle beam write time
D2S INC0 citations61
US12243712B2Mar 4, 2025
Method and system for determining a charged particle beam exposure for a local pattern density
D2S INC0 citations60
US11886166B2Jan 30, 2024
Method and system of reducing charged particle beam write time
D2S INC0 citations60
US11604451B2Mar 14, 2023
Method and system of reducing charged particle beam write time
D2S INC0 citations60
US10725383B2Jul 28, 2020
Bias correction for lithography
D2S INC0 citations52
US8895212B2Nov 25, 2014
Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
D2S INC0 citations52
US8883375B2Nov 11, 2014
Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes
D2S INC0 citations52
US8771906B2Jul 8, 2014
Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
D2S INC0 citations52
US8592108B2Nov 26, 2013
Method for design and manufacture of patterns with variable shaped beam lithography
D2S INC0 citations52
ZABLE HAROLD ROBERT
5 patentsUS8221939B2Jul 17, 2012
Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages
ZABLE HAROLD ROBERT21 citations92
US8137871B2Mar 20, 2012
Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
ZABLE HAROLD ROBERT36 citations92
US8062813B2Nov 22, 2011
Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
ZABLE HAROLD ROBERT27 citations92
US8492055B2Jul 23, 2013
Method and system for fracturing a pattern using lithography with multiple exposure passes
ZABLE HAROLD ROBERT2 citations62
US8221940B2Jul 17, 2012
Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes
ZABLE HAROLD ROBERT4 citations62