Inventor
CHOU MENG-HAN
TW15 patents
Patents
15 patentsUS11456383B2Sep 27, 2022
Semiconductor device having a contact plug with an air gap spacer
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations86
US11289417B2Mar 29, 2022
Semiconductor device and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US12432963B2Sep 30, 2025
Device having an air gap adjacent to a contact plug and covered by a doped dielectric layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12368098B2Jul 22, 2025
Methods of forming semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12183632B2Dec 31, 2024
Bottom lateral expansion of contact plugs through implantation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12112977B2Oct 8, 2024
Reducing spacing between conductive features through implantation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11973027B2Apr 30, 2024
Semiconductor device and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11901455B2Feb 13, 2024
Method of manufacturing a FinFET by implanting a dielectric with a dopant
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11615982B2Mar 28, 2023
Reducing spacing between conductive features through implantation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11502000B2Nov 15, 2022
Bottom lateral expansion of contact plugs through implantation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12300496B2May 13, 2025
Deposition window enlargement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12278141B2Apr 15, 2025
Semiconductor devices and methods of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11742210B2Aug 29, 2023
Deposition window enlargement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12426300B2Sep 23, 2025
Transistor source/drain contacts and methods of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US12199156B2Jan 14, 2025
Contact formation with reduced dopant loss and increased dimensions
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59