Inventor
CHEN CHIEN HAO
TW157 patents
⚠️ This page may combine multiple inventors who share the name “CHEN CHIEN HAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
24 patentsUS6656764B1Dec 2, 2003
Process for integration of a high dielectric constant gate insulator layer in a CMOS device
TAIWAN SEMICONDUCTOR MFG111 citations99
US7259050B2Aug 21, 2007
Semiconductor device and method of making the same
TAIWAN SEMICONDUCTOR MFG75 citations98
US7052946B2May 30, 2006
Method for selectively stressing MOSFETs to improve charge carrier mobility
TAIWAN SEMICONDUCTOR MFG84 citations98
US8383502B2Feb 26, 2013
Integrated high-K/metal gate in CMOS process flow
TAIWAN SEMICONDUCTOR MFG11 citations93
US7528028B2May 5, 2009
Super anneal for process induced strain modulation
TAIWAN SEMICONDUCTOR MFG22 citations93
US7164163B2Jan 16, 2007
Strained transistor with hybrid-strain inducing layer
TAIWAN SEMICONDUCTOR MFG47 citations93
US6624090B1Sep 23, 2003
Method of forming plasma nitrided gate dielectric layers
TAIWAN SEMICONDUCTOR MFG38 citations93
US6566205B1May 20, 2003
Method to neutralize fixed charges in high K dielectric
TAIWAN SEMICONDUCTOR MFG41 citations93
US7871915B2Jan 18, 2011
Method for forming metal gates in a gate last process
TAIWAN SEMICONDUCTOR MFG38 citations92
US7232730B2Jun 19, 2007
Method of forming a locally strained transistor
TAIWAN SEMICONDUCTOR MFG29 citations92
US7223647B2May 29, 2007
Method for forming integrated advanced semiconductor device using sacrificial stress layer
TAIWAN SEMICONDUCTOR MFG28 citations92
US7176138B2Feb 13, 2007
Selective nitride liner formation for shallow trench isolation
TAIWAN SEMICONDUCTOR MFG15 citations92
US7157350B2Jan 2, 2007
Method of forming SOI-like structure in a bulk semiconductor substrate using self-organized atomic migration
TAIWAN SEMICONDUCTOR MFG23 citations92
US7118974B2Oct 10, 2006
Method of generating multiple oxides by plasma nitridation on oxide
TAIWAN SEMICONDUCTOR MFG22 citations92
US6767847B1Jul 27, 2004
Method of forming a silicon nitride-silicon dioxide gate stack
TAIWAN SEMICONDUCTOR MFG37 citations92
US6759302B1Jul 6, 2004
Method of generating multiple oxides by plasma nitridation on oxide
TAIWAN SEMICONDUCTOR MFG35 citations92
US8841731B2Sep 23, 2014
Integrated high-k/metal gate in CMOS process flow
TAIWAN SEMICONDUCTOR MFG5 citations84
US8003507B2Aug 23, 2011
Method of integrating high-K/metal gate in CMOS process flow
TAIWAN SEMICONDUCTOR MFG8 citations84
US7482211B2Jan 27, 2009
Junction leakage reduction in SiGe process by implantation
TAIWAN SEMICONDUCTOR MFG16 citations84
US7498642B2Mar 3, 2009
Profile confinement to improve transistor performance
TAIWAN SEMICONDUCTOR MFG11 citations80
US7335544B2Feb 26, 2008
Method of making MOSFET device with localized stressor
TAIWAN SEMICONDUCTOR MFG7 citations74
US7138317B2Nov 21, 2006
Method of generating multiple oxides by plasma nitridation on oxide
TAIWAN SEMICONDUCTOR MFG9 citations74
US6914313B2Jul 5, 2005
Process for integration of a high dielectric constant gate insulator layer in a CMOS device
TAIWAN SEMICONDUCTOR MFG8 citations74
US7327009B2Feb 5, 2008
Selective nitride liner formation for shallow trench isolation
TAIWAN SEMICONDUCTOR MFG5 citations73
TAIWAN SEMICONDUCTOR MFG CO LTD
13 patentsUS9812451B2Nov 7, 2017
Field effect transistor contact with reduced contact resistance
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US9601388B2Mar 21, 2017
Integrated high-K/metal gate in CMOS process flow
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10332746B1Jun 25, 2019
Post UV cure for gapfill improvement
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations83
US11610818B2Mar 21, 2023
Semiconductor structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations75
US12255104B2Mar 18, 2025
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations74
US11532509B2Dec 20, 2022
Selective hybrid capping layer for metal gates of transistors
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11302818B2Apr 12, 2022
Gate resistance reduction through low-resistivity conductive layer
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10868140B2Dec 15, 2020
Gap-filling germanium through selective bottom-up growth
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10515963B2Dec 24, 2019
Field effect transistor contact with reduced contact resistance
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10510865B2Dec 17, 2019
Cap layer and anneal for gapfill improvement
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10269799B2Apr 23, 2019
Field effect transistor contact with reduced contact resistance
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9472414B2Oct 18, 2016
Self-aligned multiple spacer patterning process
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10741674B2Aug 11, 2020
Selective silicon growth for gapfill improvement
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
CHEN CHIEN HAO
3 patentsLIAO CHIN-I
2 patentsUNITED MICROELECTRONICS CORP
2 patentsCHEN CHIEN-HAO
2 patentsHOU YONG-TIAN
1 patentTSAI MIN-CHUAN
1 patentYANG JI-YI
1 patentTSAI MING-CHIEH
1 patentShowing the top 50 of 157 patents by PatentIndex Score.