Inventor
KHAJA ABDUL AZIZ
US44 patents
Patents
44 patentsUS9466469B2Oct 11, 2016
Remote plasma source for controlling plasma skew
APPLIED MATERIALS INC121 citations97
US10083818B2Sep 25, 2018
Auto frequency tuned remote plasma source
APPLIED MATERIALS INC8 citations83
US11670492B2Jun 6, 2023
Chamber configurations and processes for particle control
APPLIED MATERIALS INC5 citations74
US11299805B2Apr 12, 2022
Plasma corrision resistive heater for high temperature processing
APPLIED MATERIALS INC3 citations73
US10636630B2Apr 28, 2020
Processing chamber and method with thermal control
APPLIED MATERIALS INC2 citations73
US10266943B2Apr 23, 2019
Plasma corrosion resistive heater for high temperature processing
APPLIED MATERIALS INC4 citations73
US10192717B2Jan 29, 2019
Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates
APPLIED MATERIALS INC3 citations73
US9711360B2Jul 18, 2017
Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD system
APPLIED MATERIALS INC5 citations73
US11742185B2Aug 29, 2023
Uniform in situ cleaning and deposition
APPLIED MATERIALS INC2 citations72
US11674222B2Jun 13, 2023
Method of in situ ceramic coating deposition
APPLIED MATERIALS INC2 citations72
US11133212B2Sep 28, 2021
High temperature electrostatic chuck
APPLIED MATERIALS INC2 citations72
US10879041B2Dec 29, 2020
Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambers
APPLIED MATERIALS INC4 citations71
US11613808B2Mar 28, 2023
Clean processes for boron carbon film deposition
APPLIED MATERIALS INC2 citations70
US10276364B2Apr 30, 2019
Bevel etch profile control
APPLIED MATERIALS INC3 citations70
US12217937B2Feb 4, 2025
Radio frequency source for inductively coupled and capacitively coupled plasmas in substrate processing chambers
APPLIED MATERIALS INC1 citations64
US12488981B2Dec 2, 2025
Systems and methods for deposition residue control
APPLIED MATERIALS INC0 citations62
US12400843B2Aug 26, 2025
Chamber configurations and processes for particle control
APPLIED MATERIALS INC0 citations62
US12347653B2Jul 1, 2025
Uniform in situ cleaning and deposition
APPLIED MATERIALS INC0 citations62
US12234549B2Feb 25, 2025
Method of in situ ceramic coating deposition
APPLIED MATERIALS INC0 citations62
US11948790B2Apr 2, 2024
Heater support kit for bevel etch chamber
APPLIED MATERIALS INC0 citations62
US11875969B2Jan 16, 2024
Process chamber with reduced plasma arc
APPLIED MATERIALS INC0 citations62
US10930475B2Feb 23, 2021
Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
APPLIED MATERIALS INC0 citations62
US10916407B2Feb 9, 2021
Conditioning remote plasma source for enhanced performance having repeatable etch and deposition rates
APPLIED MATERIALS INC0 citations62
US10903066B2Jan 26, 2021
Heater support kit for bevel etch chamber
APPLIED MATERIALS INC1 citations62
US10663491B2May 26, 2020
Voltage-current probe for measuring radio-frequency electrical power in a high-temperature environment and method of calibrating the same
APPLIED MATERIALS INC1 citations62
US12334384B2Jun 17, 2025
Methods and apparatus for minimizing substrate backside damage
APPLIED MATERIALS INC0 citations61
US12211728B2Jan 28, 2025
Electrostatic chuck design with improved chucking and arcing performance
APPLIED MATERIALS INC0 citations61
US11756819B2Sep 12, 2023
Methods and apparatus for minimizing substrate backside damage
APPLIED MATERIALS INC0 citations61
US11682574B2Jun 20, 2023
Electrostatic chuck design with improved chucking and arcing performance
APPLIED MATERIALS INC0 citations61
US11699577B2Jul 11, 2023
Treatment for high-temperature cleans
APPLIED MATERIALS INC0 citations60
US10923334B2Feb 16, 2021
Selective deposition of hardmask
APPLIED MATERIALS INC0 citations60
US10629427B2Apr 21, 2020
Bevel etch profile control
APPLIED MATERIALS INC1 citations60
US11569072B2Jan 31, 2023
RF grounding configuration for pedestals
APPLIED MATERIALS INC0 citations59
US11515150B2Nov 29, 2022
Hardmask tuning by electrode adjustment
APPLIED MATERIALS INC0 citations57
US12575382B2Mar 10, 2026
Methods and mechanisms for adjusting chucking voltage during substrate manufacturing
APPLIED MATERIALS INC0 citations54
US11894228B2Feb 6, 2024
Treatments for controlling deposition defects
APPLIED MATERIALS INC0 citations53
US10128088B2Nov 13, 2018
Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
APPLIED MATERIALS INC0 citations52
US10109462B2Oct 23, 2018
Dual radio-frequency tuner for process control of a plasma process
APPLIED MATERIALS INC1 citations52
US9589773B2Mar 7, 2017
In-situ etch rate determination for chamber clean endpoint
APPLIED MATERIALS INC1 citations51
US10599043B2Mar 24, 2020
Critical methodology in vacuum chambers to determine gap and leveling between wafer and hardware components
APPLIED MATERIALS INC0 citations50
US11560623B2Jan 24, 2023
Methods of reducing chamber residues
APPLIED MATERIALS INC0 citations48
US12539530B2Feb 3, 2026
Throttle valve and foreline cleaning using a microwave source
APPLIED MATERIALS INC0 citations47
US10971390B2Apr 6, 2021
Methods of minimizing wafer backside damage in semiconductor wafer processing
APPLIED MATERIALS INC0 citations46
US10811325B2Oct 20, 2020
Self-healing semiconductor wafer processing
APPLIED MATERIALS INC0 citations42