Inventor
TAKEZAWA YOSHIHIRO
JP13 patents
Patents
13 patentsUS11047044B2Jun 29, 2021
Film forming apparatus and film forming method
TOKYO ELECTRON LTD2 citations70
US11260433B2Mar 1, 2022
Cleaning method of substrate processing apparatus and substrate processing apparatus
TOKYO ELECTRON LTD2 citations68
US12080552B2Sep 3, 2024
Method of depositing silicon film and film deposition apparatus
TOKYO ELECTRON LTD0 citations61
US11749530B2Sep 5, 2023
Method of removing phosphorus-doped silicon film and system therefor
TOKYO ELECTRON LTD0 citations61
US11587787B2Feb 21, 2023
Film forming method and film forming apparatus
TOKYO ELECTRON LTD0 citations61
US12252786B2Mar 18, 2025
Cleaning method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations60
US11486043B2Nov 1, 2022
Metal contamination prevention method and apparatus, and substrate processing method using the same and apparatus therefor
TOKYO ELECTRON LTD0 citations60
US9234275B2Jan 12, 2016
Method and apparatus of forming metal compound film, and electronic product
TOKYO ELECTRON LTD2 citations60
US12112947B2Oct 8, 2024
Method of crystallizing amorphous silicon film and deposition apparatus
TOKYO ELECTRON LTD0 citations58
US12351904B2Jul 8, 2025
Film deposition method and method for forming polycrystalline silicon film
TOKYO ELECTRON LTD0 citations50
US12027384B2Jul 2, 2024
Heat treatment apparatus and dummy substrate processing method
TOKYO ELECTRON LTD0 citations50
US12571125B2Mar 10, 2026
Method for forming polycrystalline silicon film
TOKYO ELECTRON LTD0 citations48
US10734221B2Aug 4, 2020
Method of manufacturing semiconductor device and method of forming metal oxide film
TOKYO ELECTRON LTD0 citations39