P

Inventor

LIN YU-HSIEN

TW61 patents
⚠️ This page may combine multiple inventors who share the name “LIN YU-HSIEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

23 patents
US10325912B2Jun 18, 2019

Semiconductor structure cutting process and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD19 citations94
US11502076B2Nov 15, 2022

Semiconductor structure cutting process and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations85
US11456182B1Sep 27, 2022

Integrated circuit structure and fabrication thereof

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations85
US11114549B2Sep 7, 2021

Semiconductor structure cutting process and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD9 citations85
US9799567B2Oct 24, 2017

Method of forming source/drain contact

TAIWAN SEMICONDUCTOR MFG CO LTD8 citations83
US10163720B2Dec 25, 2018

Method of forming source/drain contact

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US12132050B2Oct 29, 2024

Semiconductor structure cutting process and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12020987B2Jun 25, 2024

Integrated circuit structure and fabrication thereof

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11894370B2Feb 6, 2024

Semiconductor structure cutting process and structures formed thereby

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11387105B2Jul 12, 2022

Loading effect reduction through multiple coat-etch processes

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12490487B2Dec 2, 2025

Tunable structure profile

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12302596B2May 13, 2025

Fin field-effect transistor and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11942532B2Mar 26, 2024

Fin field-effect transistor and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11955547B2Apr 9, 2024

Semiconductor device including an epitaxy region

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12426229B2Sep 23, 2025

Multipatterning gate processing

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations57
US12532529B2Jan 20, 2026

Semiconductor devices and methods of manufacturing thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations55
US9996011B2Jun 12, 2018

System and method for lithography alignment

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10755936B2Aug 25, 2020

Loading effect reduction through multiple coat-etch processes

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10522413B2Dec 31, 2019

Method of forming source/drain contact

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10276392B2Apr 30, 2019

Loading effect reduction through multiple coat-etch processes

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9711604B1Jul 18, 2017

Loading effect reduction through multiple coat-etch processes

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12532499B2Jan 20, 2026

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US10164093B2Dec 25, 2018

Semiconductor device including an epitaxy region

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50

DELTA ELECTRONICS INC

7 patents

TAIWAN SEMICONDUCTOR MFG

5 patents

UNITED MICROELECTRONICS CORP

5 patents

LIN YUN JING

1 patent

LIN YU-HSIEN

1 patent

FAN WEI-HAN

1 patent

HSU JUNG-TZU

1 patent

FUTAIJING PREC ELECTRONICS YANTAI CO LTD

1 patent

HUANG CHUN-HUNG

1 patent

PRIMAX ELECTRONICS LTD

1 patent

HARBINGER TECH CORPORATION

1 patent

DO NOT USE—TAIWAN SEMICONDUCTOR MFG CO LTD

1 patent

HSU WEN-KUANG

1 patent

Showing the top 50 of 61 patents by PatentIndex Score.