Inventor
LAVAN SHANE
US15 patents
Patents
15 patentsUS11915918B2Feb 27, 2024
Cleaning of sin with CCP plasma or RPS clean
APPLIED MATERIALS INC4 citations74
US11600761B2Mar 7, 2023
High critical temperature metal nitride layer with oxide or oxynitride seed layer
APPLIED MATERIALS INC4 citations73
US11678589B2Jun 13, 2023
Method of making high critical temperature metal nitride layer
APPLIED MATERIALS INC1 citations72
US11572618B2Feb 7, 2023
Method and chamber for backside physical vapor deposition
APPLIED MATERIALS INC2 citations71
US11469096B2Oct 11, 2022
Method and chamber for backside physical vapor deposition
APPLIED MATERIALS INC2 citations70
US11600477B2Mar 7, 2023
Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process
APPLIED MATERIALS INC2 citations69
US12027354B2Jul 2, 2024
Cleaning of SIN with CCP plasma or RPS clean
APPLIED MATERIALS INC0 citations62
US12185643B2Dec 31, 2024
High critical temperature metal nitride layer with oxide or oxynitride seed layer
APPLIED MATERIALS INC0 citations61
US12096701B2Sep 17, 2024
Method of making high critical temperature metal nitride layer
APPLIED MATERIALS INC0 citations61
US12052935B2Jul 30, 2024
Method of making high critical temperature metal nitride layer
APPLIED MATERIALS INC0 citations61
USD1072774SApr 29, 2025
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC1 citations60
US12176205B2Dec 24, 2024
Method and chamber for backside physical vapor deposition
APPLIED MATERIALS INC0 citations59
US12142478B2Nov 12, 2024
Method and chamber for backside physical vapor deposition
APPLIED MATERIALS INC0 citations59
US11450514B1Sep 20, 2022
Methods of reducing particles in a physical vapor deposition (PVD) chamber
APPLIED MATERIALS INC0 citations59
US12183560B2Dec 31, 2024
Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process
APPLIED MATERIALS INC0 citations58