Inventor
BARCLAY GEORGE G
US54 patents
⚠️ This page may combine multiple inventors who share the name “BARCLAY GEORGE G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHIPLEY CO LLC
28 patentsUS6306554B1Oct 23, 2001
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
SHIPLEY CO LLC89 citations98
US6316165B1Nov 13, 2001
Planarizing antireflective coating compositions
SHIPLEY CO LLC105 citations97
US6680159B2Jan 20, 2004
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
SHIPLEY CO LLC41 citations96
US6492086B1Dec 10, 2002
Phenolic/alicyclic copolymers and photoresists
SHIPLEY CO LLC46 citations96
US6406828B1Jun 18, 2002
Polymer and photoresist compositions
SHIPLEY CO LLC39 citations96
US6136501AOct 24, 2000
Polymers and photoresist compositions comprising same
SHIPLEY CO LLC60 citations96
US6692888B1Feb 17, 2004
Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same
SHIPLEY CO LLC56 citations94
US5861231AJan 19, 1999
Copolymers and photoresist compositions comprising copolymer resin binder component
SHIPLEY CO LLC69 citations94
US6803171B2Oct 12, 2004
Photoimageable composition
SHIPLEY CO LLC52 citations93
US6855466B2Feb 15, 2005
Planarizing antireflective coating compositions
SHIPLEY CO LLC27 citations92
US6599677B2Jul 29, 2003
Polymer and photoresist compositions
SHIPLEY CO LLC15 citations92
US6107425AAug 22, 2000
Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists
SHIPLEY CO LLC24 citations92
US6379861B1Apr 30, 2002
Polymers and photoresist compositions comprising same
SHIPLEY CO LLC14 citations84
US7244542B2Jul 17, 2007
Resins and photoresist compositions comprising same
SHIPLEY CO LLC16 citations83
US6849381B2Feb 1, 2005
Copolymers and photoresist compositions comprising same
SHIPLEY CO LLC12 citations82
US6165674ADec 26, 2000
Polymers and photoresist compositions for short wavelength imaging
SHIPLEY CO LLC10 citations74
US7189490B2Mar 13, 2007
Photoresists containing sulfonamide component
SHIPLEY CO LLC9 citations73
US6777157B1Aug 17, 2004
Copolymers and photoresist compositions comprising same
SHIPLEY CO LLC6 citations72
US6841331B2Jan 11, 2005
Polymers, processes for polymer synthesis and photoresist compositions
SHIPLEY CO LLC10 citations70
US7306892B2Dec 11, 2007
Multilayer photoresist system
SHIPLEY CO LLC2 citations63
US7105266B2Sep 12, 2006
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
SHIPLEY CO LLC1 citations63
US7008750B2Mar 7, 2006
Processes for producing polysiloxanes and photoresist compositions comprising same
SHIPLEY CO LLC2 citations62
US6849376B2Feb 1, 2005
Polymers and photoresist compositions comprising same
SHIPLEY CO LLC4 citations62
US7211365B2May 1, 2007
Negative photoresists for short wavelength imaging
SHIPLEY CO LLC4 citations61
US7022455B2Apr 4, 2006
Photoacid-labile polymers and photoresists comprising same
SHIPLEY CO LLC2 citations54
US7118847B2Oct 10, 2006
Polymer and photoresist compositions
SHIPLEY CO LLC0 citations52
US7217490B2May 15, 2007
Processes for producing silane monomers and polymers and photoresist compositions comprising same
SHIPLEY CO LLC0 citations51
US7090968B2Aug 15, 2006
Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same
SHIPLEY CO LLC1 citations51
ROHM & HAAS ELECT MAT
9 patentsUS7662981B2Feb 16, 2010
Leveler compounds
ROHM & HAAS ELECT MAT19 citations92
US7582412B2Sep 1, 2009
Multilayer photoresist systems
ROHM & HAAS ELECT MAT28 citations92
US7510639B2Mar 31, 2009
Leveler compounds
ROHM & HAAS ELECT MAT20 citations92
US7297616B2Nov 20, 2007
Methods, photoresists and substrates for ion-implant lithography
ROHM & HAAS ELECT MAT18 citations92
US7700256B2Apr 20, 2010
Phenolic/alicyclic copolymers and photoresists
ROHM & HAAS ELECT MAT8 citations84
US9209028B2Dec 8, 2015
Ion implantation methods
ROHM & HAAS ELECT MAT4 citations71
US7390608B2Jun 24, 2008
Photoresists containing Si-polymers
ROHM & HAAS ELECT MAT3 citations62
US10558122B2Feb 11, 2020
Compositions comprising sulfonamide material and processes for photolithography
ROHM & HAAS ELECT MAT0 citations52
US10222699B2Mar 5, 2019
Compositions and processes for immersion lithography
ROHM & HAAS ELECT MAT0 citations52
WANG DEYAN
8 patentsUS8871428B2Oct 28, 2014
Compositions and processes for immersion lithography
WANG DEYAN4 citations84
US8257902B2Sep 4, 2012
Compositons and processes for immersion lithography
WANG DEYAN10 citations84
US8262891B2Sep 11, 2012
Leveler compounds
WANG DEYAN7 citations83
US8722825B2May 13, 2014
Surface active additive and photoresist composition comprising same
WANG DEYAN4 citations73
US8506788B2Aug 13, 2013
Leveler compounds
WANG DEYAN3 citations62
US10359698B2Jul 23, 2019
Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography
WANG DEYAN0 citations52
US9005880B2Apr 14, 2015
Compositions comprising sulfonamide material and processes for photolithography
WANG DEYAN1 citations52
US8975006B2Mar 10, 2015
Compositions comprising carboxy component and processes for photolithography
WANG DEYAN1 citations52
IBM
1 patentCORNELL RES FOUNDATION INC
1 patentRohm and Hass Electronic Materials LLC
1 patentCAPORALE STEFAN J
1 patentLI MINGQI
1 patentShowing the top 50 of 54 patents by PatentIndex Score.