Inventor
GOTH GEORGE R
US21 patents
⚠️ This page may combine multiple inventors who share the name “GOTH GEORGE R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
19 patentsUS4508579AApr 2, 1985
Lateral device structures using self-aligned fabrication techniques
IBM273 citations99
US4704368ANov 3, 1987
Method of making trench-incorporated monolithic semiconductor capacitor and high density dynamic memory cells including the capacitor
IBM72 citations96
US4549927AOct 29, 1985
Method of selectively exposing the sidewalls of a trench and its use to the forming of a metal silicide substrate contact for dielectric filled deep trench isolated devices
IBM78 citations95
US4589193AMay 20, 1986
Metal silicide channel stoppers for integrated circuits and method for making the same
IBM85 citations94
US4824797AApr 25, 1989
Self-aligned channel stop
IBM29 citations92
US4758528AJul 19, 1988
Self-aligned metal process for integrated circuit metallization
IBM38 citations92
US4719185AJan 12, 1988
Method of making shallow junction complementary vertical bipolar transistor pair
IBM41 citations92
US4717678AJan 5, 1988
Method of forming self-aligned P contact
IBM30 citations92
US4691219ASep 1, 1987
Self-aligned polysilicon base contact structure
IBM26 citations92
US4400865AAug 30, 1983
Self-aligned metal process for integrated circuit metallization
IBM46 citations92
US6021360AFeb 1, 2000
Process controller for balancing usage of tool sets
IBM23 citations91
US4534826AAug 13, 1985
Trench etch process for dielectric isolation
IBM51 citations91
US4541168ASep 17, 1985
Method for making metal contact studs between first level metal and regions of a semiconductor device compatible with polyimide-filled deep trench isolation schemes
IBM32 citations88
US4665007AMay 12, 1987
Planarization process for organic filling of deep trenches
IBM51 citations87
US4743565AMay 10, 1988
Lateral device structures using self-aligned fabrication techniques
IBM18 citations74
US4608589AAug 26, 1986
Self-aligned metal structure for integrated circuits
IBM11 citations74
US4151010AApr 24, 1979
Forming adjacent impurity regions in a semiconductor by oxide masking
IBM17 citations74
US6518145B1Feb 11, 2003
Methods to control the threshold voltage of a deep trench corner device
IBM10 citations73
US6967375B2Nov 22, 2005
Reduction of chemical mechanical planarization (CMP) scratches with sacrificial dielectric polish stop
IBM2 citations58