Inventor
IGUCHI ETSUKO
JP23 patents
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TOKYO OHKA KOGYO CO LTD
22 patentsUS5736296AApr 7, 1998
Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound
TOKYO OHKA KOGYO CO LTD46 citations96
US6268108B1Jul 31, 2001
Composition for forming antireflective coating film and method for forming resist pattern using same
TOKYO OHKA KOGYO CO LTD40 citations93
US6284428B1Sep 4, 2001
Undercoating composition for photolithographic resist
TOKYO OHKA KOGYO CO LTD29 citations92
US6071673AJun 6, 2000
Method for the formation of resist pattern
TOKYO OHKA KOGYO CO LTD26 citations92
US5948847ASep 7, 1999
Undercoating composition for photolithographic patterning
TOKYO OHKA KOGYO CO LTD19 citations92
US5756255AMay 26, 1998
Undercoating composition for photolithography
TOKYO OHKA KOGYO CO LTD38 citations92
US5700625ADec 23, 1997
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD22 citations92
US6042988AMar 28, 2000
Chemical-amplification-type negative resist composition
TOKYO OHKA KOGYO CO LTD20 citations90
US6319815B1Nov 20, 2001
Electric wiring forming method with use of embedding material
TOKYO OHKA KOGYO CO LTD32 citations89
US6693049B2Feb 17, 2004
Method for filling fine hole
TOKYO OHKA KOGYO CO LTD17 citations84
US6689535B2Feb 10, 2004
Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern
TOKYO OHKA KOGYO CO LTD14 citations84
US6544717B2Apr 8, 2003
Undercoating composition for photolithographic resist
TOKYO OHKA KOGYO CO LTD14 citations84
US6087068AJul 11, 2000
Undercoating composition for photolithographic resist
TOKYO OHKA KOGYO CO LTD13 citations74
US6083665AJul 4, 2000
Photoresist laminate and method for patterning using the same
TOKYO OHKA KOGYO CO LTD11 citations74
US5925495AJul 20, 1999
Photoresist laminate and method for patterning using the same
TOKYO OHKA KOGYO CO LTD15 citations74
US5908738AJun 1, 1999
Undercoating composition for photolithography
TOKYO OHKA KOGYO CO LTD15 citations74
US5789136AAug 4, 1998
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD9 citations74
US6297174B2Oct 2, 2001
Method for the formation of a planarizing coating film on substrate surface
TOKYO OHKA KOGYO CO LTD7 citations73
US6159652ADec 12, 2000
Positive resist composition
TOKYO OHKA KOGYO CO LTD12 citations73
US6599682B2Jul 29, 2003
Method for forming a finely patterned photoresist layer
TOKYO OHKA KOGYO CO LTD2 citations63
US6734258B2May 11, 2004
Protective coating composition for dual damascene process
TOKYO OHKA KOGYO CO LTD5 citations62
US5854357ADec 29, 1998
Process for the production of polyhydroxstyrene
TOKYO OHKA KOGYO CO LTD3 citations62