Inventor
MIURA SHIGEHIRO
JP39 patents
⚠️ This page may combine multiple inventors who share the name “MIURA SHIGEHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
37 patentsUS10202687B2Feb 12, 2019
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD12 citations84
US9111747B2Aug 18, 2015
Film deposition apparatus, substrate processing apparatus and film deposition method
TOKYO ELECTRON LTD15 citations84
US8927440B2Jan 6, 2015
Film deposition apparatus and method of depositing film
TOKYO ELECTRON LTD8 citations84
US8871654B2Oct 28, 2014
Film deposition apparatus, and method of depositing a film
TOKYO ELECTRON LTD13 citations84
US10480067B2Nov 19, 2019
Film deposition method
TOKYO ELECTRON LTD2 citations73
US9865499B2Jan 9, 2018
Method and apparatus for gap fill using deposition and etch processes
TOKYO ELECTRON LTD2 citations73
US9777369B2Oct 3, 2017
Method of depositing a film, recording medium, and film deposition apparatus
TOKYO ELECTRON LTD2 citations73
US9711370B2Jul 18, 2017
Substrate processing apparatus and method of processing a substrate
TOKYO ELECTRON LTD2 citations73
US9583312B2Feb 28, 2017
Film formation device, substrate processing device, and film formation method
TOKYO ELECTRON LTD5 citations73
US9466483B2Oct 11, 2016
Film deposition apparatus and film deposition method
TOKYO ELECTRON LTD4 citations73
US9376751B2Jun 28, 2016
Plasma processing device and operation method
TOKYO ELECTRON LTD3 citations73
US10072336B2Sep 11, 2018
Film forming apparatus, film forming method, and recording medium
TOKYO ELECTRON LTD5 citations72
US9714467B2Jul 25, 2017
Method for processing a substrate and substrate processing apparatus
TOKYO ELECTRON LTD5 citations72
US9502215B2Nov 22, 2016
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD2 citations63
US9209011B2Dec 8, 2015
Method of operating film deposition apparatus and film deposition apparatus
TOKYO ELECTRON LTD2 citations63
US11479852B2Oct 25, 2022
Method for dry cleaning a susceptor and substrate processing apparatus
TOKYO ELECTRON LTD1 citations62
US11085113B2Aug 10, 2021
Film forming method and recording medium
TOKYO ELECTRON LTD0 citations62
US10683573B2Jun 16, 2020
Film forming apparatus
TOKYO ELECTRON LTD1 citations62
US10604837B2Mar 31, 2020
Film deposition apparatus
TOKYO ELECTRON LTD1 citations62
US10358720B2Jul 23, 2019
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations62
US11390948B2Jul 19, 2022
Film forming apparatus
TOKYO ELECTRON LTD0 citations60
US11274372B2Mar 15, 2022
Film deposition apparatus
TOKYO ELECTRON LTD0 citations52
US11131023B2Sep 28, 2021
Film deposition apparatus and film deposition method
TOKYO ELECTRON LTD0 citations52
US11118264B2Sep 14, 2021
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations52
US10217642B2Feb 26, 2019
Substrate processing apparatus, substrate processing method and substrate holding member
TOKYO ELECTRON LTD0 citations52
US10103009B2Oct 16, 2018
Plasma processing device and operation method
TOKYO ELECTRON LTD0 citations52
US10043639B2Aug 7, 2018
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations52
US10151031B2Dec 11, 2018
Method for processing a substrate and substrate processing apparatus
TOKYO ELECTRON LTD1 citations51
US10385453B2Aug 20, 2019
Film forming apparatus
TOKYO ELECTRON LTD0 citations49
US11328901B2May 10, 2022
Deposition method
TOKYO ELECTRON LTD0 citations47
US9583318B2Feb 28, 2017
Plasma processing apparatus, plasma processing method, and recording medium
TOKYO ELECTRON LTD1 citations47
US9865454B2Jan 9, 2018
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations42
US9607828B2Mar 28, 2017
Method of depositing a silicon-containing film
TOKYO ELECTRON LTD0 citations42
US10796902B2Oct 6, 2020
Film deposition method
TOKYO ELECTRON LTD0 citations41
US10287675B2May 14, 2019
Film deposition method
TOKYO ELECTRON LTD0 citations41
US10151034B2Dec 11, 2018
Substrate processing method including supplying a fluorine-containing gas on a surface of a substrate
TOKYO ELECTRON LTD0 citations41
US9601318B2Mar 21, 2017
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations40