Inventor
MIYA GO
JP21 patents
⚠️ This page may combine multiple inventors who share the name “MIYA GO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
15 patentsUS7396771B2Jul 8, 2008
Plasma etching apparatus and plasma etching method
HITACHI HIGH TECH CORP15 citations84
US10872742B2Dec 22, 2020
Charged particle beam device
HITACHI HIGH TECH CORP8 citations83
US7887669B2Feb 15, 2011
Vacuum processing apparatus
HITACHI HIGH TECH CORP11 citations82
US7744721B2Jun 29, 2010
Plasma processing apparatus
HITACHI HIGH TECH CORP7 citations74
US6899766B2May 31, 2005
Diagnosis method for semiconductor processing apparatus
HITACHI HIGH TECH CORP6 citations74
US6866744B2Mar 15, 2005
Semiconductor processing apparatus and a diagnosis method therefor
HITACHI HIGH TECH CORP5 citations74
US9401297B2Jul 26, 2016
Electrostatic chuck mechanism and charged particle beam apparatus
HITACHI HIGH TECH CORP5 citations70
US7713756B2May 11, 2010
Apparatus and method for plasma etching
HITACHI HIGH TECH CORP2 citations63
US11735394B2Aug 22, 2023
Charged particle beam apparatus
HITACHI HIGH TECH CORP1 citations62
US12106930B2Oct 1, 2024
Charged particle beam device
HITACHI HIGH TECH CORP1 citations60
US7147747B2Dec 12, 2006
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP1 citations52
US7147748B2Dec 12, 2006
Plasma processing method
HITACHI HIGH TECH CORP1 citations52
US9799486B2Oct 24, 2017
Charged particle beam apparatus for measuring surface potential of a sample
HITACHI HIGH TECH CORP0 citations41
US9704731B2Jul 11, 2017
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations41
US10128141B2Nov 13, 2018
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations40