Inventor
USHIROGOUCHI TORU
JP52 patents
⚠️ This page may combine multiple inventors who share the name “USHIROGOUCHI TORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
36 patentsUS6303266B1Oct 16, 2001
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK149 citations99
US6025117AFeb 15, 2000
Method of forming a pattern using polysilane
TOSHIBA KK423 citations98
US6959986B2Nov 1, 2005
Liquid ink and recording apparatus
TOSHIBA KK54 citations96
US6824957B2Nov 30, 2004
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK42 citations96
US6280897B1Aug 28, 2001
Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts
TOSHIBA KK80 citations96
US5837419ANov 17, 1998
Photosensitive composition
TOSHIBA KK44 citations96
US5691101ANov 25, 1997
Photosensitive composition
TOSHIBA KK86 citations96
US6440636B1Aug 27, 2002
Polymeric compound and resin composition for photoresist
TOSHIBA KK58 citations95
US6660450B2Dec 9, 2003
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK18 citations93
US6541597B2Apr 1, 2003
Resin useful for resist, resist composition and pattern forming process using the same
TOSHIBA KK20 citations93
US6291129B1Sep 18, 2001
Monomer, high molecular compound and photosensitive composition
TOSHIBA KK22 citations93
US6228552B1May 8, 2001
Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material
TOSHIBA KK39 citations93
US6197473B1Mar 6, 2001
Photosensitive composition and a pattern forming process using the same
TOSHIBA KK52 citations93
US6045968AApr 4, 2000
Photosensitive composition
TOSHIBA KK26 citations93
US7125112B2Oct 24, 2006
Liquid ink and recording apparatus
TOSHIBA KK12 citations92
US6071670AJun 6, 2000
Transparent resin, photosensitive composition, and method of forming a pattern
TOSHIBA KK37 citations92
US6060207AMay 9, 2000
Photosensitive material
TOSHIBA KK36 citations92
US5932391AAug 3, 1999
Resist for alkali development
TOSHIBA KK31 citations92
US5928841AJul 27, 1999
Method of photoetching at 180 to 220
TOSHIBA KK20 citations92
US5348838ASep 20, 1994
Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group
TOSHIBA KK39 citations92
US4988601AJan 29, 1991
Photosensitive resin composition with o-quinone diazide and novolac resins prepared from mixed phenolic reactants to include 3,5-xylenol and 2,5-xylenol
TOSHIBA KK36 citations92
US4871646AOct 3, 1989
Polysilane compound and photosensitive composition
TOSHIBA KK24 citations92
US5372914ADec 13, 1994
Pattern forming method
TOSHIBA KK29 citations91
US6410748B1Jun 25, 2002
Alicycli c group-containing monomer
TOSHIBA KK15 citations84
US6190841B1Feb 20, 2001
Pattern forming process and a photosensitive composition
TOSHIBA KK12 citations74
US6168897B1Jan 2, 2001
Method of forming patterns
TOSHIBA KK12 citations74
US5853952ADec 29, 1998
Color developing organic material, color developing resin composition and colored thin film pattern
TOSHIBA KK7 citations74
US7108367B2Sep 19, 2006
Liquid ink and recording apparatus
TOSHIBA KK10 citations73
US5169740ADec 8, 1992
Positive type and negative type ionization irradiation sensitive and/or deep u.v. sensitive resists comprising a halogenated resin binder
TOSHIBA KK13 citations73
US7163781B2Jan 16, 2007
Process for producing a semiconductor device
TOSHIBA KK2 citations63
US7119156B2Oct 10, 2006
Resist resin
TOSHIBA KK2 citations63
US7070905B2Jul 4, 2006
Pattern forming process
TOSHIBA KK1 citations63
US7029823B2Apr 18, 2006
Resist composition
TOSHIBA KK2 citations63
US6177229B1Jan 23, 2001
Photosensitive composition
TOSHIBA KK3 citations63
US5091282AFeb 25, 1992
Alkali soluble phenol polymer photosensitive composition
TOSHIBA KK4 citations63
US7896484B2Mar 1, 2011
Ink jet recording apparatus
TOSHIBA KK2 citations62
TOSHIBA TEC KK
12 patentsUS7803851B2Sep 28, 2010
Inkjet ink
TOSHIBA TEC KK20 citations92
US7500745B2Mar 10, 2009
Liquid ink and recording apparatus
TOSHIBA TEC KK16 citations92
US7375145B2May 20, 2008
Inkjet ink
TOSHIBA TEC KK9 citations83
US7439281B2Oct 21, 2008
Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion
TOSHIBA TEC KK6 citations74
US7473720B2Jan 6, 2009
Photosensitive inkjet ink
TOSHIBA TEC KK6 citations73
US7417074B2Aug 26, 2008
Ink for ink jet and ink jet recording apparatus
TOSHIBA TEC KK7 citations73
US7387380B2Jun 17, 2008
Liquid ink and recording apparatus
TOSHIBA TEC KK4 citations73
US7754785B2Jul 13, 2010
Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion
TOSHIBA TEC KK3 citations63
US7858670B2Dec 28, 2010
Photosensitive inkjet ink
TOSHIBA TEC KK6 citations62
US7579390B2Aug 25, 2009
Inkjet ink composition and printed matters created using inkjet ink composition
TOSHIBA TEC KK2 citations59
US7425525B2Sep 16, 2008
Washing solution for inkjet printer head and washing method using the solution
TOSHIBA TEC KK1 citations52
US7285581B2Oct 23, 2007
Processed pigments, pigment-dispersed solution, ink for ink jet, manufacturing method of processed pigments and manufacturing method of pigment-dispersed solution
TOSHIBA TEC KK1 citations52
TOKYO SHIBAURA ELECTRIC CO
1 patentSANO KENJI
1 patentShowing the top 50 of 52 patents by PatentIndex Score.