Photosensitive composition

Abstract

Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.

What is claimed is:  
     
       1. A slurry photosensitive composition containing: 
       (i) from 0.01 to 20 parts by weight of an acid generating compound which generates an acid when irradiated with light or ionizing radiation and selected from the group consisting of a (1) quinonediazide compound, (2) an organic halide or (3) an onium salt which is a (3a) diazonium salt selected from the group consisting of:                    
       or a (3) salt of the formula:                    
       said acid functioning as a catalyst for a crosslinking reaction or a decomposition reaction; 
       (ii) at least one acid-crosslinkable or acid decomposable resin; and  
       (iii) from 14 to 98 parts by weight of a powder.  
     
     
       2. The composition of  claim 1 , wherein said at least one acid-crosslinkable resin is selected from the group consisting of a homopolymer or copolymer of vinyl alcohol, a copolymer of maleic anhydride, a hydroxy group, COOH group or acetal group containing resin having acid reactivity and a dehydration condensation property, a copolymer of polyamic acid, a polyamino acid or acrylic acid and a vinyl compound having a double bond on a side chain thereof, a methylol group containing melamine resin, an acrylic copolymer having a double bond on a side chain thereof, an acrylic copolymer containing an epoxy group, a polymer having a double bond which is formed of allylether or ethylvinylether, an epoxy resin which is alkali soluble, an acrylic acid or carboxylic acid derivative modified epoxy resin, which is alkali soluble, a phenolic resin and an acetalized polyvinyl alcohol formed of the repeating unit:                    
       wherein R 1  is a monovalent organic group. 
     
     
       3. A composition according to  claim 1 , wherein said resin is an acetal resin. 
     
     
       4. A composition according to  claim 3 , wherein said acetal resin has repeating units represented by Formulas (1) and (2) below:                    
       wherein R 1  represents a hydrogen atom or a monovalent organic group. 
     
     
       5. A composition according to  claim 4 , wherein the weight-average molecular weight (Mw) of said acetal resin is 1,000-300,000. 
     
     
       6. A composition according to  claim 1 , wherein said powder is a fluorescent powder. 
     
     
       7. A composition according to  claim 1 , wherein said powder is a light-absorbing pigment. 
     
     
       8. A slurry photosensitive composition containing: 
         i )  from  0 . 01  to  20  parts by weight of an acid generating compound which generates an acid when irradiated with light or ionizing radiation and selected from the group consisting of an organic halide and an onium salt, with the proviso that when the onium salt is a diazonium salt, said salt is selected from the group consisting of:                      
         said acid functioning as a catalyst for a cross - linking reaction or a decomposition reaction;    
         ii )  at least one acid - crosslinkable or acid decomposable compound; and    
         iii )  from  14  to  98  parts by weight of a powder with respect to the total solid component in the composition;  wherein  in the event an organic solvent is added to said slurry composition, said organic solvent is ethanol or propanol; and    
       
         the slurry photosensitive composition is heated after it has been irradiated. 
       
     
     
       9. The composition of  claim 1 , wherein said acid generating compound is an onium salt represented by the formula: