Inventor · disambiguated record
Takuya Naito
Also filed as: NAITO TAKUYA
13 granted patents·2 pending applications·400 citations·filing 1991–2016
93Inventor score
Top patents by PatentIndex Score
15 records- 0192US5691101APhotosensitive compositionTOSHIBA KK·Filed 1996·Granted Nov 25, 1997·86 cites·7 claims
- 0290US6280897B1Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic partsTOSHIBA KK·Filed 1997·Granted Aug 28, 2001·80 cites·12 claims
- 0387US5332648APotosensitive composition and method of forming a pattern using the sameTOSHIBA KK·Filed 1991·Granted Jul 26, 1994·79 cites·21 claims
- 0482US5348838APhotosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl groupTOSHIBA KK·Filed 1992·Granted Sep 20, 1994·39 cites·32 claims
- 0575US6060207APhotosensitive materialTOSHIBA KK·Filed 1995·Granted May 9, 2000·36 cites·21 claims
- 0674US5372914APattern forming methodTOSHIBA KK·Filed 1993·Granted Dec 13, 1994·29 cites·16 claims
- 0765US5928841AMethod of photoetching at 180 to 220TOSHIBA KK·Filed 1995·Granted Jul 27, 1999·20 cites·21 claims
- 0855US6168897B1Method of forming patternsTOSHIBA KK·Filed 1999·Granted Jan 2, 2001·12 cites·12 claims
- 0940US6340552B1Photosensitive composition containing a dissolution inhibitor and an acid releasing compoundTOSHIBA KK·Filed 1994·Granted Jan 22, 2002·6 cites·4 claims
- 1039US5853952AColor developing organic material, color developing resin composition and colored thin film patternTOSHIBA KK·Filed 1996·Granted Dec 29, 1998·7 cites·5 claims
- 1138USRE38256EPhotosensitive compositionTOKYO SHIBAURA ELECTRIC CO·Filed 1999·Granted Sep 23, 2003·4 cites·9 claims
- 1235US2004101787A1Fine pattern forming methodFiled 2002·Application pending·0 cites
- 1335US2017120327A1Silver nanowires, and production method and dispersion of the sameTHE UNIV OF SHIGA PREFECTURE·Filed 2016·Application pending·0 cites
- 1430US6974658B2High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic componentsTOSHIBA KK·Filed 2003·Granted Dec 13, 2005·0 cites·15 claims
- 1530US6306553B1Photosensitive composition and method of forming a pattern using the sameTOSHIBA KK·Filed 1995·Granted Oct 23, 2001·2 cites·20 claims
Join the waitlist — get patent alerts
Get an alert when Takuya Naito files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →