Inventor · disambiguated record
Hirokazu Niki
Also filed as: NIKI HIROKAZU
15 granted patents·945 citations·filing 1990–1999
95Inventor score
Top patents by PatentIndex Score
15 records- 0197US5432023AFuel cellTOSHIBA KK·Filed 1994·Granted Jul 11, 1995·222 cites·6 claims
- 0297US5364711AFuel cellTOSHIBA KK·Filed 1993·Granted Nov 15, 1994·233 cites·20 claims
- 0392US5691101APhotosensitive compositionTOSHIBA KK·Filed 1996·Granted Nov 25, 1997·86 cites·7 claims
- 0491US5403695AResist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groupsTOSHIBA KK·Filed 1992·Granted Apr 4, 1995·83 cites·16 claims
- 0589US5658706AResist composition for forming a pattern comprising a pyridinium compound as an additiveTOSHIBA KK·Filed 1994·Granted Aug 19, 1997·82 cites·7 claims
- 0688US5326675APattern forming method including the formation of an acidic coating layer on the radiation-sensitive layerTOSHIBA KK·Filed 1992·Granted Jul 5, 1994·49 cites·18 claims
- 0779US5100768APhotosensitive compositionTOSHIBA KK·Filed 1990·Granted Mar 31, 1992·34 cites·12 claims
- 0874US5744281AResist composition for forming a pattern and method of forming a pattern wherein the composition 4-phenylpyridine as an additiveTOSHIBA KK·Filed 1997·Granted Apr 28, 1998·34 cites·6 claims
- 0974US5372914APattern forming methodTOSHIBA KK·Filed 1993·Granted Dec 13, 1994·29 cites·16 claims
- 1071US5580702AMethod for forming resist patternsTOSHIBA KK·Filed 1994·Granted Dec 3, 1996·31 cites·18 claims
- 1166USRE35821EPattern forming method including the formation of an acidic coating layer on the radiation-sensitive layerTOSHIBA KK·Filed 1996·Granted Jun 9, 1998·23 cites·1 claims
- 1264US5279921APattern formation resist and pattern formation methodTOSHIBA KK·Filed 1991·Granted Jan 18, 1994·25 cites·10 claims
- 1341US5188924APattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium saltTOSHIBA KK·Filed 1991·Granted Feb 23, 1993·6 cites·21 claims
- 1438USRE38256EPhotosensitive compositionTOKYO SHIBAURA ELECTRIC CO·Filed 1999·Granted Sep 23, 2003·4 cites·9 claims
- 1536US5091282AAlkali soluble phenol polymer photosensitive compositionTOSHIBA KK·Filed 1990·Granted Feb 25, 1992·4 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →