Inventor

HAYASHI SHINICHIRO

JP66 patents

⚠️ This page may combine multiple inventors who share the name “HAYASHI SHINICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HAYASHI SHINICHIRO

SYMETRIX CORP

Ferroelectric flat panel displays

Method and apparatus for fabricating silicon dioxide and silicon glass layers in integrated circuits

Interlayer oxide containing thin films for high dielectric constant application

Ferroelectric memory with disturb protection

Ferroelectric memory with ferroelectric thin film having thickness of 90 nanometers or less, and method of making same

Misted precursor deposition apparatus and method with improved mist and mist flow

Method of liquid deposition by selection of liquid viscosity and other precursor properties

Method for forming an integrated circuit

Ferroelectric field effect transistor

Misted precursor deposition apparatus and method with improved mist and mist flow

Low imprint ferroelectric material for long retention memory and method of making the same

Low imprint ferroelectric material for long retention memory and method of making the same

Method for fabricating ferroelectric field effect transistor having an interface insulator layer formed by a liquid precursor

Misted precursor deposition apparatus and method with improved mist and mist flow

Liquid source formation of thin films using hexamethyl-disilazane

Liquid source formation of thin films using hexamethyl-disilazane

Integrated circuit capacitors with barrier layer and process for making the same

Method and apparatus for fabrication of integrated circuit by selective deposition of precursor liquid

Interlayer oxide containing thin films for high dielectric constant application of the formula AB2O6 or AB2O7

Low temperature process for fabricating layered superlattice materials and making electronic devices including same

Method of forming magnesium oxide films on glass substrate for use in plasma display panels

Methods and apparatus for material deposition using primer

Misted deposition method with applied UV radiation

Ferroelectric device with capping layer and method of making same

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Semiconductor device with oxygen diffusion barrier layer termed from composite nitride

DC sputtering process for making smooth electrodes and thin film ferroelectric capacitors having improved memory retention

Semiconductor device using a conductive film and method of manufacturing the same

Capacitor and method for fabricating the same

Thin film ferroelectric capacitors having improved memory retention through the use of essentially smooth bottom electrode structures

Method for forming ferroelectric film and semiconductor device

Method of fabricating semiconductor device with capacitor covered by a TEOS-03 film

Semiconductor device and method and system for fabricating the same

Tunneling transistor applicable to nonvolatile memory

Method of making ferroelectric thin film having a randomly oriented layer and spherical crystal conductor structure

Method for fabricating semiconductor device and semiconductor device

Capacitive element and semiconductor memory device

Thin film ferroelectric capacitors having improved memory retention through the use of essentially smooth bottom electrode structures

Ferroelectric capacitor device

Semiconductor device with an oxygen diffusion barrier layer formed from a composite nitride

UNIV TEXAS

Peptide tumor cell growth inhibitors

Peptide tumor cell growth inhibitors

Methods of inhibiting CXC intercrine molecules

OGAWA YUICHI

Sample analysis method

Measurement apparatus and measurement method

Terahertz wave measuring apparatus having space arrangement structure and measuring method

PANASONIC CORP

Inductor and method for fabricating the same

HAYASHI SHINICHIRO

Assembling construction of clip to mountable member

MATSUSHITA ELECTRONICS CORP

Thin film ferroelectric capacitors having improved memory retention through the use of essentially smooth bottom electrode structures

MITSUBISHI ELECTRIC CORP

Line filter

SAKURA COLOR PROD CORP

Eraser