Inventor

YOSHIOKA NOBUYUKI

JP55 patents

⚠️ This page may combine multiple inventors who share the name “YOSHIOKA NOBUYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YOSHIOKA NOBUYUKI

MITSUBISHI ELECTRIC CORP

Phase shift mask and manufacturing method thereof

Attenuating type phase shifting mask and method of manufacturing thereof

Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof

Semiconductor device having diffusion regions formed with an ion beam absorber pattern

Phase shift mask and method for repairing a defect of a phase shift mask

Method and apparatus for cleaning photomask

Method and apparatus for cleaning photomask

Phase shift mask of attenuation type and manufacturing method thereof

Photomask, manufacturing method thereof, and semiconductor device

Registration accuracy measurement mark

Method of forming a T-shaped control electrode through an X-ray mask

Attenuating type phase shifting mask, method of manufacturing thereof and semiconductor device manufactured by using the mask

Method of ion implantation

Mask for x-ray lithography and method of manufacturing the same

Mask for X-ray lityhography and method of manufacturing the same

Method for microfabrication of pattern on substrate using X-ray sensitive resist

Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photomask and method of exposure thereof

X-ray mask and its fabrication method

X-ray mask and a manufacture method therefor

Method of exposure employing phase shift mask of attenuation type

Method of forming a T shaped control electrode through an X-ray mask

ULVAC COATING CORP

Phase-shifting photomask blank and method of manufacturing the same as well as phase-shifting photomask

Phase shift mask and manufacturing method thereof and exposure method using phase shift mask

Phase shift mask and manufacturing method thereof and exposure method using phase shift mask

Phase shift mask and manufacturing method thereof and exposure method using phase shift mask

Phase-shifting photomask blank, phase-shifting photomask, and method of manufacturing them

Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank

Phase shift mask and manufacturing method thereof and exposure method using phase shift mask comprising a semitransparent region

Phase shift mask and manufacturing method thereof and exposure method using phase shift mask

Phase-shift photo mask blank, phase-shift photo mask and method for fabricating semiconductor devices

Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blank

MEIDENSHA ELECTRIC MFG CO LTD

Process for forming contact material including the step of preparing chromium with an oxygen content substantially reduced to less than 0.1 wt. %

Process and system for treating material containing noxious components

Method for forming an electrical contact material

System for treating material containing noxious components

Method of making a non-linear voltage-dependent resistor

Electrode material

WADA OSAMU

Resin-coated carrier method of manufacturing the same, two-component developer including resin-coated carrier, developing device and image forming apparatus

Resin coated carrier, two-component developer, developing device and image forming apparatus

RENESAS TECH CORP

Phase shifter film and process for the same

Phase shifter film and process for the same

KAMOTO TAKANORI

Method for producing resin-coated carrier, resin-coated carrier, two-component developer, developing device, image forming apparatus and image forming method

Carrier, developer, development device, image forming apparatus and image forming method

MITSUBISHIDENKI KABUSHIKI KAIS

Method of and apparatus for washing photomask and washing solution for photomask

ULCOAT ULVAC COATING CORP

Method of manufacturing phase-shifting photomask blank

IWAKIRI NORIO

Polymer and method for producing same

SHARP KK

Optical sensing unit and touch panel device including the same

DAINIPPON INK & CHEMICALS

Agricultural and horticultural guanidine-type fungicide and process for production thereof

YOSHIOKA NOBUYUKI

Amino group-containing phosphorylcholine, and method for producing same

WATANABE & CO LTD M

Method of and apparatus for washing photomask and washing solution for photomask