Inventor

TAN SOON YOENG

MY19 patents

⚠️ This page may combine multiple inventors who share the name “TAN SOON YOENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAN SOON YOENG

GLOBALFOUNDRIES SG PTE LTD

Integrated circuit system with sub-geometry removal and method of manufacture thereof

Method and apparatus for removing radiation side lobes

Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques

Multi-project wafer with IP protection by reticle mask pattern modification

Pellicles and devices comprising a photomask and the pellicle

Methods for converting planar designs to FinFET designs in the design and fabrication of integrated circuits

Semiconductor wafers employing a fixed-coordinate metrology scheme and methods for fabricating integrated circuits using the same

CHARTERED SEMICONDUCTOR MFG

Half tone alternating phase shift masks

Method and apparatus for contact hole unit cell formation

Method for dual damascene patterning with single exposure using tri-tone phase shift mask

Mask and method to pattern chromeless phase lithography contact hole

Cross technology reticles

TAN SOON YOENG

Providing conversion of a planar design to a FinFET design

Integrated circuit system with sealring and method of manufacture thereof

Integrated circuit system with sub-geometry removal and method of manufacture thereof

IP protection

TAN SIA KIM

Mask and method to pattern chromeless phase lithography contact hole

GLOBALFOUNDRIES INC

Forming alignment mark and resulting mark

NING GUO XIANG

Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques