Inventor

NOJO HARUKI

JP11 patents

⚠️ This page may combine multiple inventors who share the name “NOJO HARUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

3 patents

US6059920AMay 9, 2000

Semiconductor device polishing apparatus having improved polishing liquid supplying apparatus, and polishing liquid supplying method

TOSHIBA KK59 citations95

US6224464B1May 1, 2001

Polishing method and polisher used in the method

TOSHIBA KK39 citations92

US6419557B2Jul 16, 2002

Polishing method and polisher used in the method

TOSHIBA KK14 citations84

INFINEON TECHNOLOGIES AG

2 patents

US6443811B1Sep 3, 2002

Ceria slurry solution for improved defect control of silicon dioxide chemical-mechanical polishing

INFINEON TECHNOLOGIES AG40 citations91

US6303506B1Oct 16, 2001

Compositions for and method of reducing/eliminating scratches and defects in silicon dioxide during CMP process

INFINEON TECHNOLOGIES AG16 citations83

DUPONT AIR PROD NANOMATERIALS

2 patents

US7968465B2Jun 28, 2011

Periodic acid compositions for polishing ruthenium/low K substrates

DUPONT AIR PROD NANOMATERIALS9 citations78

US7316976B2Jan 8, 2008

Polishing method to reduce dishing of tungsten on a dielectric

DUPONT AIR PROD NANOMATERIALS2 citations53

EKC TECHNOLOGY K K

1 patent

US6827752B2Dec 7, 2004

Cerium oxide slurry, and method of manufacturing substrate

EKC TECHNOLOGY K K7 citations68

MATSUSHITA TAKAYUKI

1 patent

US8540894B2Sep 24, 2013

Polishing composition

MATSUSHITA TAKAYUKI1 citations45

SAMSUNG SDI CO LTD

1 patent

US10723916B2Jul 28, 2020

Organic film CMP slurry composition and polishing method using same

SAMSUNG SDI CO LTD0 citations40

NOJO HARUKI

1 patent

US9676966B2Jun 13, 2017

Chemical mechanical polishing composition and process

NOJO HARUKI0 citations26