Inventor

POSLAVSKY LEONID

US49 patents

⚠️ This page may combine multiple inventors who share the name “POSLAVSKY LEONID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

POSLAVSKY LEONID

KLA TENCOR CORP

Model for optical dispersion of high-K dielectrics including defects

Bright and dark field scatterometry systems for line roughness metrology

Dispersion model for band gap tracking

Model based measurement systems with improved electromagnetic solver performance

Confined illumination for small spot size metrology

Multi-model metrology

Meta-model based measurement refinement

Modal method modeling of binary gratings with improved eigenvalue computation

High throughput thin film characterization and defect detection

Signal response metrology based on measurements of proxy structures

Film measurement

Dispersion model for band gap tracking

Dynamic removal of correlation of highly correlated parameters for optical metrology

Confined illumination for small spot size metrology

Multi-oscillator, continuous Cody-Lorentz model of optical dispersion

Feed forward of metrology data in a metrology system

Metrology system calibration refinement

Metrology system calibration refinement

Calculated electrical performance metrics for process monitoring and yield management

Secondary target design for optical measurements

Semiconductor device models including re-usable sub-structures

System, method, and computer program product for automatically determining a parameter causing an abnormal semiconductor metrology measurement

Metrology system, method, and computer program product employing automatic transitioning between utilizing a library and utilizing regression for measurement processing

Metrology through use of feed forward feed sideways and measurement cell re-use

Generating a model using global node optimization

Optical system polarizer calibration

Spectral matching based calibration

Library expansion system, method, and computer program product for metrology

KLA TENCOR TECH CORP

Optical metrology on patterned samples

Film measurement using reflectance computation

Film measurement

Film measurement

APPLIED MATERIALS INC

Method and apparatus for measuring etch uniformity of a semiconductor wafer

Apparatus and method for endpoint control and plasma monitoring

JIN WEN

Accurate and fast neural network training for library-based critical dimension (CD) metrology

Accurate and fast neural network training for library-based critical dimension (CD) metrology

KUZNETSOV ALEXANDER

Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspection

JIANG PEILIN

Optimized spatial modeling for optical CD metrology

ADEL MICHAEL

Metrology through use of feed forward feed sideways and measurement cell re-use

KAACK TORSTEN R

Calculation method for local film stress measurements using local film thickness values

ILORETA JONATHAN

Techniques for optimized scatterometry

KWAK HIDONG

Multi-analyzer angle spectroscopic ellipsometry

LEE LIE QUAN

Automatic wavelength or angle pruning for optical metrology

KLA CORP

Dispersion model for band gap tracking

DE VEER JOHANNES D

Optical system polarizer calibration

Di ming

Measurement of composition for thin films

CAO MENG

Automatic selection of sample values for optical metrology

SHIH MENG-FU

Method of determining an asymmetric property of a structure

BACKUES MARK

Automatic determination of fourier harmonic order for computation of spectral information for diffraction structures