Inventor
KU VINCENT W
US26 patents
⚠️ This page may combine multiple inventors who share the name “KU VINCENT W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
19 patentsUS7591907B2Sep 22, 2009
Apparatus for hybrid chemical processing
APPLIED MATERIALS INC375 citations99
US7204886B2Apr 17, 2007
Apparatus and method for hybrid chemical processing
APPLIED MATERIALS INC525 citations99
US7186385B2Mar 6, 2007
Apparatus for providing gas to a processing chamber
APPLIED MATERIALS INC128 citations99
US6905541B2Jun 14, 2005
Method and apparatus of generating PDMAT precursor
APPLIED MATERIALS INC119 citations99
US6838125B2Jan 4, 2005
Method of film deposition using activated precursor gases
APPLIED MATERIALS INC197 citations99
US7402210B2Jul 22, 2008
Apparatus and method for hybrid chemical processing
APPLIED MATERIALS INC61 citations98
US7228873B2Jun 12, 2007
Valve design and configuration for fast delivery system
APPLIED MATERIALS INC61 citations98
US6772072B2Aug 3, 2004
Method and apparatus for monitoring solid precursor delivery
APPLIED MATERIALS INC127 citations98
US7429361B2Sep 30, 2008
Method and apparatus for providing precursor gas to a processing chamber
APPLIED MATERIALS INC23 citations96
US7270709B2Sep 18, 2007
Method and apparatus of generating PDMAT precursor
APPLIED MATERIALS INC50 citations96
US7066194B2Jun 27, 2006
Valve design and configuration for fast delivery system
APPLIED MATERIALS INC61 citations96
US6939801B2Sep 6, 2005
Selective deposition of a barrier layer on a dielectric material
APPLIED MATERIALS INC56 citations96
US6955211B2Oct 18, 2005
Method and apparatus for gas temperature control in a semiconductor processing system
APPLIED MATERIALS INC70 citations95
US7569191B2Aug 4, 2009
Method and apparatus for providing precursor gas to a processing chamber
APPLIED MATERIALS INC15 citations93
US7597758B2Oct 6, 2009
Chemical precursor ampoule for vapor deposition processes
APPLIED MATERIALS INC16 citations92
US7524374B2Apr 28, 2009
Method and apparatus for generating a precursor for a semiconductor processing system
APPLIED MATERIALS INC26 citations92
US7678194B2Mar 16, 2010
Method for providing gas to a processing chamber
APPLIED MATERIALS INC4 citations74
US7588736B2Sep 15, 2009
Apparatus and method for generating a chemical precursor
APPLIED MATERIALS INC7 citations74
US7867896B2Jan 11, 2011
Sequential deposition of tantalum nitride using a tantalum-containing precursor and a nitrogen-containing precursor
APPLIED MATERIALS INC2 citations63