Inventor
OOYABU JUN
JP12 patents
⚠️ This page may combine multiple inventors who share the name “OOYABU JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
10 patentsUS6072147AJun 6, 2000
Plasma processing system
TOKYO ELECTRON LTD261 citations98
US6723202B2Apr 20, 2004
Worktable device and plasma processing apparatus for semiconductor process
TOKYO ELECTRON LTD124 citations94
US7882800B2Feb 8, 2011
Ring mechanism, and plasma processing device using the ring mechanism
TOKYO ELECTRON LTD31 citations92
US6576860B2Jun 10, 2003
Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate
TOKYO ELECTRON LTD28 citations92
US6426477B1Jul 30, 2002
Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate
TOKYO ELECTRON LTD32 citations92
USD412513SAug 3, 1999
Upper electrode for manufacturing semiconductors
TOKYO ELECTRON LTD17 citations92
US7658816B2Feb 9, 2010
Focus ring and plasma processing apparatus
TOKYO ELECTRON LTD36 citations91
US7506610B2Mar 24, 2009
Plasma processing apparatus and method
TOKYO ELECTRON LTD15 citations84
US7494561B2Feb 24, 2009
Plasma processing apparatus and method, and electrode plate for plasma processing apparatus
TOKYO ELECTRON LTD12 citations84
US7481240B2Jan 27, 2009
Partial pressure control system, flow rate control system and shower plate used for partial pressure control system
TOKYO ELECTRON LTD10 citations83