Inventor

YANG JUNG-CHAN

TW90 patents

Patents

50 patents

US11093684B2Aug 17, 2021

Double height cell regions, semiconductor device having the same, and method of generating a layout diagram corresponding to the same

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84

US10740531B2Aug 11, 2020

Integrated circuit, system for and method of forming an integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84

US10734321B2Aug 4, 2020

Integrated circuit and method of manufacturing same

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84

US10446555B2Oct 15, 2019

Buried metal track and methods forming same

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84

US12074168B2Aug 27, 2024

Semiconductor device and method of manufacturing the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73

US12019969B2Jun 25, 2024

Power rail with non-linear edge

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73

US11756952B2Sep 12, 2023

Integrated circuit and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73

US11756999B2Sep 12, 2023

Double height cell regions, semiconductor device having the same, and method of generating a layout diagram corresponding to the same

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73

US11637098B2Apr 25, 2023

Pin modification for standard cells

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73

US11556688B2Jan 17, 2023

Integrated circuit layout method and system

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73

US11552069B1Jan 10, 2023

Integrated circuit and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73

US11037920B2Jun 15, 2021

Pin modification for standard cells

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73

US10854499B2Dec 1, 2020

Integrated circuit, system for and method of forming an integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73

US10559558B2Feb 11, 2020

Pin modification for standard cells

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73

US10783313B2Sep 22, 2020

Method for improved cut metal patterning

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72

US10672708B2Jun 2, 2020

Standard-cell layout structure with horn power and smart metal cut

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72

US11081479B1Aug 3, 2021

Integrated circuit layout with asymmetric metal lines

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71

US11188703B2Nov 30, 2021

Integrated circuit, system, and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations70

US10331838B2Jun 25, 2019

Semiconductor device with fill cells

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70

US11688731B2Jun 27, 2023

Integrated circuit device and method

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations67

US12443782B2Oct 14, 2025

Metal cut region location method

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12417332B2Sep 16, 2025

Integrated circuit, system for and method of forming an integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12340165B2Jun 24, 2025

Semiconductor device having power rail with non-linear edge

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12243914B2Mar 4, 2025

Different height cell subregions, semiconductor device having the same, and method of generating a layout diagram corresponding to the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12237322B2Feb 25, 2025

Semiconductor device having fin structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12176394B2Dec 24, 2024

Different height cell subregions, and semiconductor device having the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12159899B2Dec 3, 2024

Semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12125792B2Oct 22, 2024

Method of making a semiconductor device with V2V rail

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12073170B2Aug 27, 2024

Integrated circuit, system for and method of forming an integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12056432B2Aug 6, 2024

Pin modification for standard cells

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11983479B2May 14, 2024

Integrated circuit, system for and method of forming an integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11908851B2Feb 20, 2024

Semiconductor device having fin structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11735625B2Aug 22, 2023

Semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11704465B2Jul 18, 2023

Integrated circuit, system for and method of forming an integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11664380B2May 30, 2023

Semiconductor device and method of manufacturing the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11636248B2Apr 25, 2023

Metal cut region location system

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11637069B2Apr 25, 2023

Semiconductor device with V2V rail and methods of making same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11574110B2Feb 7, 2023

Method of forming an integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US11461528B2Oct 4, 2022

Integrated circuit, system for and method of forming an integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US10997348B2May 4, 2021

Metal cut region location method and system

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63

US12593497B2Mar 31, 2026

Integrated circuit in hybrid row height structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12369389B2Jul 22, 2025

Integrated circuit in hybrid row height structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12353816B2Jul 8, 2025

Structure and method of rectangular cell in semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12324228B2Jun 3, 2025

Methods of resistance and capacitance reduction to circuit output nodes

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

US12302642B2May 13, 2025

Integrated circuit and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62

Showing the top 50 of 90 patents by PatentIndex Score.

YANG JUNG-CHAN

Patents

Power rail with non-linear edge

Method of designing an integrated circuit and integrated circuit

Semiconductor device and method of manufacturing the same

Buried metal track and methods forming same

Integrated circuit layout method, device, and system

Double height cell regions, semiconductor device having the same, and method of generating a layout diagram corresponding to the same

Integrated circuit, system for and method of forming an integrated circuit

Integrated circuit and method of manufacturing same

Buried metal track and methods forming same

Semiconductor device and method of manufacturing the same

Power rail with non-linear edge

Integrated circuit and method of forming the same

Double height cell regions, semiconductor device having the same, and method of generating a layout diagram corresponding to the same

Pin modification for standard cells

Integrated circuit layout method and system

Integrated circuit and method of forming the same

Pin modification for standard cells

Integrated circuit, system for and method of forming an integrated circuit

Pin modification for standard cells

Method for improved cut metal patterning

Standard-cell layout structure with horn power and smart metal cut

Integrated circuit layout with asymmetric metal lines

Integrated circuit, system, and method of forming the same

Semiconductor device with fill cells

Integrated circuit device and method

Metal cut region location method

Integrated circuit, system for and method of forming an integrated circuit

Semiconductor device having power rail with non-linear edge

Different height cell subregions, semiconductor device having the same, and method of generating a layout diagram corresponding to the same

Semiconductor device having fin structure

Different height cell subregions, and semiconductor device having the same

Semiconductor device

Method of making a semiconductor device with V2V rail

Integrated circuit, system for and method of forming an integrated circuit

Pin modification for standard cells

Integrated circuit, system for and method of forming an integrated circuit

Semiconductor device having fin structure

Semiconductor device

Integrated circuit, system for and method of forming an integrated circuit

Semiconductor device and method of manufacturing the same

Metal cut region location system

Semiconductor device with V2V rail and methods of making same

Method of forming an integrated circuit

Integrated circuit, system for and method of forming an integrated circuit

Metal cut region location method and system

Integrated circuit in hybrid row height structure

Integrated circuit in hybrid row height structure

Structure and method of rectangular cell in semiconductor device

Methods of resistance and capacitance reduction to circuit output nodes

Integrated circuit and method of forming the same