Inventor

MIYANAGA MICHIMASA

JP33 patents

⚠️ This page may combine multiple inventors who share the name “MIYANAGA MICHIMASA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MIYANAGA MICHIMASA

SUMITOMO ELECTRIC INDUSTRIES

Nitride semiconductor wafer

Porous ceramics and method of preparing the same as well as microstrip substrate

Wavelength converter manufacturing method and wavelength converter

Si3N4 ceramic, Si-base composition for its production, and method for its production

Silicon nitride sinter having high thermal conductivity and process for preparing the same

Silicon nitride sintered body, method of preparing the same and nitrided compact

Silicon nitride composite substrate

Composite of III-nitride crystal on laterally stacked substrates

Method of manufacturing III-nitride crystal

AlxGa1-xN crystal substrate

III-nitride single-crystal growth method

Porous silicon nitride ceramics and method for producing the same

Si3N4 sintered body with high thermal conductivity and method for producing the same

Composite of III-nitride crystal on laterally stacked substrates

Si(1-V-W-X)CWAlXNV substrate, and epitaxial wafer

Group III nitride single crystal and method of its growth

AlxGa(1-x)N single crystal, method of producing AlxGa(1-x)N single crystal, and optical lens

Process for producing Si(1-v-w-x)CwAlxNv base material, process for producing epitaxial wafer, Si(1-v-w-x)CwAlxNv base material, and epitaxial wafer

Thin film of aluminum nitride and process for producing the thin film of aluminum nitride

SATOH ISSEI

Wavelength conversion element and method for manufacturing wavelength conversion element

Process for producing Si(1-v-w-x)CwAlxNv base material, process for producing epitaxial wafer, Si(1-v-w-x)CwAlxNv base material, and epitaxial wafer

Compound semiconductor single-crystal manufacturing device and manufacturing method

Method of manufacturing a Si(1-v-w-x)CwAlxNv substrate, method of manufacturing an epitaxial wafer, Si(1-v-w-x)CwAlxNv substrate, and epitaxial wafer

Nitride semiconductor crystal manufacturing apparatus, nitride semiconductor crystal manufacturing method, and nitride semiconductor crystal

MIZUHARA NAHO

Group-III nitride crystal composite

Method of manufacturing III-nitride crystal, and semiconductor device utilizing the crystal

AlN crystal and method for growing the same, and AlN crystal substrate

MIYANAGA MICHIMASA

Method for growing group III nitride semiconductor crystal and growing device for group III nitride semiconductor crystal

Method for growing AlxGa1-xN crystal, and AlxGa1-xN crystal substrate

Composite material, part for continuous casting, continuous casting nozzle, continuous casting method, cast material, and magnesium alloy cast coil material

TANIZAKI KEISUKE

Method for growing aluminum nitride crystal, process for producing aluminum nitride crystal, and aluminum nitride crystal

ARAKAWA SATOSHI

Method of manufacturing nitride substrate, and nitride substrate

NUMANO MASATADA

Coil material and method for manufacturing the same