Inventor
KOMATSU TOMOHITO
JP18 patents
⚠️ This page may combine multiple inventors who share the name “KOMATSU TOMOHITO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
15 patentsUSD601521SOct 6, 2009
Heater for manufacturing semiconductor
TOKYO ELECTRON LTD30 citations91
USD589471SMar 31, 2009
Heater for manufacturing semiconductor
TOKYO ELECTRON LTD37 citations91
US9552966B2Jan 24, 2017
Antenna for plasma generation, plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD2 citations73
US9520272B2Dec 13, 2016
Microwave emission mechanism, microwave plasma source and surface wave plasma processing apparatus
TOKYO ELECTRON LTD3 citations73
US7488374B2Feb 10, 2009
Trapping device, processing system, and method removing impurities
TOKYO ELECTRON LTD7 citations72
US7299566B2Nov 27, 2007
Substrate-placing mechanism having substrate-heating function
TOKYO ELECTRON LTD4 citations61
US10557200B2Feb 11, 2020
Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plate
TOKYO ELECTRON LTD1 citations58
US9548187B2Jan 17, 2017
Microwave radiation antenna, microwave plasma source and plasma processing apparatus
TOKYO ELECTRON LTD1 citations51
US11164730B2Nov 2, 2021
Plasma probe device and plasma processing apparatus
TOKYO ELECTRON LTD0 citations50
US9991097B2Jun 5, 2018
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations50
US11508556B2Nov 22, 2022
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations44
US10727030B2Jul 28, 2020
Microwave plasma source and plasma processing apparatus
TOKYO ELECTRON LTD0 citations41
US10211032B2Feb 19, 2019
Microwave plasma source and plasma processing apparatus
TOKYO ELECTRON LTD0 citations41
US8055125B2Nov 8, 2011
Substrate stage mechanism and substrate processing apparatus
TOKYO ELECTRON LTD0 citations40
US10804078B2Oct 13, 2020
Plasma processing apparatus and gas introduction mechanism
TOKYO ELECTRON LTD0 citations36