Inventor
KIM YUN-JUN
KR15 patents
⚠️ This page may combine multiple inventors who share the name “KIM YUN-JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG SDI CO LTD
7 patentsUS10066057B2Sep 4, 2018
Organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD2 citations70
US10312074B2Jun 4, 2019
Method of producing layer structure, layer structure, and method of forming patterns
SAMSUNG SDI CO LTD2 citations68
US9348229B2May 24, 2016
Hardmask composition and method of forming patterns using the hardmask composition
SAMSUNG SDI CO LTD2 citations61
US9683114B2Jun 20, 2017
Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition
SAMSUNG SDI CO LTD0 citations50
US10332751B2Jun 25, 2019
Monomer, organic layer composition, organic layer, and method of forming patterns
SAMSUNG SDI CO LTD0 citations39
US10018914B2Jul 10, 2018
Hardmask composition and method of forming patterns using the hardmask composition
SAMSUNG SDI CO LTD0 citations39
US9371444B2Jun 21, 2016
Hardmask composition and method of forming patterns using the hardmask composition
SAMSUNG SDI CO LTD0 citations39
CHEIL IND INC
3 patentsUS9725389B2Aug 8, 2017
Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition
CHEIL IND INC2 citations71
US9556094B2Jan 31, 2017
Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
CHEIL IND INC6 citations71
US9671688B2Jun 6, 2017
Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
CHEIL IND INC0 citations39
CHOI YOO-JEONG
3 patentsUS8952373B2Feb 10, 2015
Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns
CHOI YOO-JEONG6 citations69
US9665003B2May 30, 2017
Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
CHOI YOO-JEONG3 citations68
US9359276B2Jun 7, 2016
Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition
CHOI YOO-JEONG1 citations49