Inventor
HAYASHI KONOSUKE
JP20 patents
⚠️ This page may combine multiple inventors who share the name “HAYASHI KONOSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHIBAURA MECHATRONICS CORP
19 patentsUS9964358B2May 8, 2018
Substrate processing apparatus and substrate processing method
SHIBAURA MECHATRONICS CORP7 citations82
US9811096B2Nov 7, 2017
Liquid feeding device and substrate treating device
SHIBAURA MECHATRONICS CORP9 citations81
US10460961B2Oct 29, 2019
Substrate processing apparatus
SHIBAURA MECHATRONICS CORP3 citations72
US10281210B2May 7, 2019
Substrate processing apparatus and substrate processing method
SHIBAURA MECHATRONICS CORP4 citations72
US9607865B2Mar 28, 2017
Substrate processing device and substrate processing method
SHIBAURA MECHATRONICS CORP2 citations72
US9553003B2Jan 24, 2017
Substrate processing device and substrate processing method
SHIBAURA MECHATRONICS CORP6 citations72
US9586391B2Mar 7, 2017
Bonding apparatus and method for manufacturing bonded substrate
SHIBAURA MECHATRONICS CORP3 citations71
US9795999B2Oct 24, 2017
Substrate processing apparatus and substrate processing method
SHIBAURA MECHATRONICS CORP2 citations70
US10586727B2Mar 10, 2020
Suction stage, lamination device, and method for manufacturing laminated substrate
SHIBAURA MECHATRONICS CORP3 citations66
US10607863B2Mar 31, 2020
Substrate processing apparatus
SHIBAURA MECHATRONICS CORP1 citations61
US10325787B2Jun 18, 2019
Substrate processing apparatus and substrate processing method
SHIBAURA MECHATRONICS CORP1 citations60
US11670522B2Jun 6, 2023
Processing liquid generator and substrate processing apparatus using the same
SHIBAURA MECHATRONICS CORP0 citations51
US9972513B2May 15, 2018
Device and method for treating a substrate with hydrofluoric and nitric acid
SHIBAURA MECHATRONICS CORP1 citations51
US10406566B2Sep 10, 2019
Substrate processing device and substrate processing method
SHIBAURA MECHATRONICS CORP0 citations50
US9694371B2Jul 4, 2017
Substrate treatment apparatus and substrate treatment method
SHIBAURA MECHATRONICS CORP1 citations50
US9741596B2Aug 22, 2017
Bonding apparatus and bonding process method
SHIBAURA MECHATRONICS CORP1 citations49
US10276406B2Apr 30, 2019
Substrate processing device and substrate processing method
SHIBAURA MECHATRONICS CORP0 citations41
US9966282B2May 8, 2018
Substrate processing apparatus and substrate processing method
SHIBAURA MECHATRONICS CORP0 citations41
US8377251B2Feb 19, 2013
Spin processing apparatus and spin processing method
SHIBAURA MECHATRONICS CORP0 citations41