Inventor
WITTY DEREK R
US37 patents
⚠️ This page may combine multiple inventors who share the name “WITTY DEREK R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
22 patentsUS6465051B1Oct 15, 2002
Method of operating high density plasma CVD reactor with combined inductive and capacitive coupling
APPLIED MATERIALS INC221 citations99
US7871926B2Jan 18, 2011
Methods and systems for forming at least one dielectric layer
APPLIED MATERIALS INC77 citations98
US7112541B2Sep 26, 2006
In-situ oxide capping after CVD low k deposition
APPLIED MATERIALS INC64 citations98
US7018941B2Mar 28, 2006
Post treatment of low k dielectric films
APPLIED MATERIALS INC674 citations98
US9721784B2Aug 1, 2017
Ultra-conformal carbon film deposition
APPLIED MATERIALS INC29 citations93
US7670924B2Mar 2, 2010
Air gap integration scheme
APPLIED MATERIALS INC22 citations93
US7166544B2Jan 23, 2007
Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors
APPLIED MATERIALS INC20 citations93
US6413871B2Jul 2, 2002
Nitrogen treatment of polished halogen-doped silicon glass
APPLIED MATERIALS INC40 citations92
US7867578B2Jan 11, 2011
Method for depositing an amorphous carbon film with improved density and step coverage
APPLIED MATERIALS INC12 citations84
US7790635B2Sep 7, 2010
Method to increase the compressive stress of PECVD dielectric films
APPLIED MATERIALS INC8 citations83
US7704816B2Apr 27, 2010
Boron derived materials deposition method
APPLIED MATERIALS INC8 citations83
US7611996B2Nov 3, 2009
Multi-stage curing of low K nano-porous films
APPLIED MATERIALS INC10 citations83
US7816205B2Oct 19, 2010
Method of forming non-volatile memory having charge trap layer with compositional gradient
APPLIED MATERIALS INC5 citations74
US10074534B2Sep 11, 2018
Ultra-conformal carbon film deposition
APPLIED MATERIALS INC5 citations71
US7964442B2Jun 21, 2011
Methods to obtain low k dielectric barrier with superior etch resistivity
APPLIED MATERIALS INC2 citations63
US7514125B2Apr 7, 2009
Methods to improve the in-film defectivity of PECVD amorphous carbon films
APPLIED MATERIALS INC2 citations63
US7501354B2Mar 10, 2009
Formation of low K material utilizing process having readily cleaned by-products
APPLIED MATERIALS INC6 citations62
US7547643B2Jun 16, 2009
Techniques promoting adhesion of porous low K film to underlying barrier layer
APPLIED MATERIALS INC6 citations59
US8343881B2Jan 1, 2013
Silicon dioxide layer deposited with BDEAS
APPLIED MATERIALS INC0 citations52
US7802538B2Sep 28, 2010
Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors
APPLIED MATERIALS INC0 citations52
US10236182B2Mar 19, 2019
Conformal amorphous carbon for spacer and spacer protection applications
APPLIED MATERIALS INC0 citations51
US9570303B2Feb 14, 2017
Conformal amorphous carbon for spacer and spacer protection applications
APPLIED MATERIALS INC0 citations51
BALSEANU MIHAELA
5 patentsUS8138104B2Mar 20, 2012
Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ UV cure
BALSEANU MIHAELA479 citations98
US8148269B2Apr 3, 2012
Boron nitride and boron-nitride derived materials deposition method
BALSEANU MIHAELA22 citations92
US8563090B2Oct 22, 2013
Boron film interface engineering
BALSEANU MIHAELA5 citations73
US8252653B2Aug 28, 2012
Method of forming a non-volatile memory having a silicon nitride charge trap layer
BALSEANU MIHAELA2 citations62
US8501568B2Aug 6, 2013
Method of forming flash memory with ultraviolet treatment
BALSEANU MIHAELA0 citations52
NGUYEN VICTOR
4 patentsUS8586487B2Nov 19, 2013
Low temperature plasma enhanced chemical vapor deposition of conformal silicon carbon nitride and silicon nitride films
NGUYEN VICTOR7 citations83
US8337950B2Dec 25, 2012
Method for depositing boron-rich films for lithographic mask applications
NGUYEN VICTOR9 citations82
US9984868B2May 29, 2018
PEALD of films comprising silicon nitride
NGUYEN VICTOR3 citations70
US8598020B2Dec 3, 2013
Plasma-enhanced chemical vapor deposition of crystalline germanium
NGUYEN VICTOR1 citations51