Inventor
NAKASE MAKOTO
JP24 patents
⚠️ This page may combine multiple inventors who share the name “NAKASE MAKOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
23 patentsUS6280897B1Aug 28, 2001
Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts
TOSHIBA KK80 citations96
US5837419ANov 17, 1998
Photosensitive composition
TOSHIBA KK44 citations96
US5691101ANov 25, 1997
Photosensitive composition
TOSHIBA KK86 citations96
US6291129B1Sep 18, 2001
Monomer, high molecular compound and photosensitive composition
TOSHIBA KK22 citations93
US6228552B1May 8, 2001
Photo-sensitive material, method of forming a resist pattern and manufacturing an electronic parts using photo-sensitive material
TOSHIBA KK39 citations93
US6045968AApr 4, 2000
Photosensitive composition
TOSHIBA KK26 citations93
US6071670AJun 6, 2000
Transparent resin, photosensitive composition, and method of forming a pattern
TOSHIBA KK37 citations92
US6060207AMay 9, 2000
Photosensitive material
TOSHIBA KK36 citations92
US5932391AAug 3, 1999
Resist for alkali development
TOSHIBA KK31 citations92
US5928841AJul 27, 1999
Method of photoetching at 180 to 220
TOSHIBA KK20 citations92
US5863699AJan 26, 1999
Photo-sensitive composition
TOSHIBA KK24 citations92
US5837405ANov 17, 1998
Reticle
TOSHIBA KK28 citations92
US5756254AMay 26, 1998
Resist, method of forming a resist pattern and manufacturing an electronic parts using the resist
TOSHIBA KK25 citations92
US5589305ADec 31, 1996
Method of fabricating a reticle
TOSHIBA KK19 citations92
US6410748B1Jun 25, 2002
Alicycli c group-containing monomer
TOSHIBA KK15 citations84
US5234780AAug 10, 1993
Exposure mask, method of manufacturing the same, and exposure method using the same
TOSHIBA KK20 citations82
US6168897B1Jan 2, 2001
Method of forming patterns
TOSHIBA KK12 citations74
US5853952ADec 29, 1998
Color developing organic material, color developing resin composition and colored thin film pattern
TOSHIBA KK7 citations74
US5660956AAug 26, 1997
Reticle and method of fabricating reticle
TOSHIBA KK16 citations73
US5595844AJan 21, 1997
Method of exposing light in a method of fabricating a reticle
TOSHIBA KK12 citations73
US5358808AOct 25, 1994
Exposure mask, method of manufacturing the same, and exposure method using the same
TOSHIBA KK10 citations70
US5407786AApr 18, 1995
Method of forming a mask on a semiconductor substrate via photosensitive resin deposition, ammonia treatment and selective silylation
TOSHIBA KK14 citations69
US5188924AFeb 23, 1993
Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt
TOSHIBA KK6 citations61