P

Inventor

HAZAMA HIROAKI

JP49 patents
⚠️ This page may combine multiple inventors who share the name “HAZAMA HIROAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

44 patents
US7079437B2Jul 18, 2006

Nonvolatile semiconductor memory device having configuration of NAND strings with dummy memory cells adjacent to select transistors

TOSHIBA KK129 citations98
US6055181AApr 25, 2000

Nonvolatile semiconductor memory device capable of storing multi-value data of more than one bit in a memory cell

TOSHIBA KK58 citations96
US5815436ASep 29, 1998

Multi-level nonvolatile semiconductor memory device having improved programming level and read/write multi-level data circuits

TOSHIBA KK75 citations96
US5162880ANov 10, 1992

Nonvolatile memory cell having gate insulation film with carrier traps therein

TOSHIBA KK95 citations96
US5514904AMay 7, 1996

Semiconductor device with monocrystalline gate insulating film

TOSHIBA KK57 citations95
US7038291B2May 2, 2006

Semiconductor device and method of fabricating the same

TOSHIBA KK48 citations93
US6844590B2Jan 18, 2005

Semiconductor device with trench isolation between two regions having different gate insulating films

TOSHIBA KK20 citations93
US6667507B2Dec 23, 2003

Flash memory having memory section and peripheral circuit section

TOSHIBA KK24 citations93
US7898867B2Mar 1, 2011

Nonvolatile semiconductor memory device including plural memory cells and a dummy cell coupled to an end of a memory cell

TOSHIBA KK25 citations92
US7196370B2Mar 27, 2007

Nonvolatile semiconductor memory device having trench-type isolation region, and method of fabricating the same

TOSHIBA KK27 citations92
US6828627B2Dec 7, 2004

Semiconductor device

TOSHIBA KK23 citations92
US6828624B1Dec 7, 2004

Nonvolatile semiconductor memory device covered with insulating film which is hard for an oxidizing agent to pass therethrough

TOSHIBA KK33 citations92
US6798038B2Sep 28, 2004

Manufacturing method of semiconductor device with filling insulating film into trench

TOSHIBA KK43 citations92
US6703669B1Mar 9, 2004

Semiconductor device having serially connected memory cell transistors provided between two current terminals

TOSHIBA KK23 citations92
US5907393AMay 25, 1999

Exposure mask and method and apparatus for manufacturing the same

TOSHIBA KK32 citations92
US5837405ANov 17, 1998

Reticle

TOSHIBA KK28 citations92
US5728494AMar 17, 1998

Exposure mask and method and apparatus for manufacturing the same

TOSHIBA KK26 citations92
US5629115AMay 13, 1997

Exposure mask and method and apparatus for manufacturing the same

TOSHIBA KK33 citations92
US5589305ADec 31, 1996

Method of fabricating a reticle

TOSHIBA KK19 citations92
US6228717B1May 8, 2001

Method of manufacturing semiconductor devices with alleviated electric field concentration at gate edge portions

TOSHIBA KK32 citations89
US7263000B2Aug 28, 2007

NAND type memory with dummy cells adjacent to select transistors being biased at different voltage during data erase

TOSHIBA KK20 citations88
US7786524B2Aug 31, 2010

Semiconductor device and method of manufacturing the same

TOSHIBA KK15 citations84
US7038268B2May 2, 2006

Nonvolatile semiconductor memory device

TOSHIBA KK18 citations84
US6943453B2Sep 13, 2005

Superconductor device and method of manufacturing the same

TOSHIBA KK12 citations84
US7795667B2Sep 14, 2010

Semiconductor memory preventing an electric short circuit between a word line and a semiconductor substrate, and manufacturing method for the semiconductor memory

TOSHIBA KK7 citations74
US7361951B2Apr 22, 2008

Flash memory having memory section and peripheral circuit section

TOSHIBA KK6 citations74
US6977409B2Dec 20, 2005

Flash memory having memory section and peripheral circuit section

TOSHIBA KK5 citations74
US6975019B2Dec 13, 2005

Semiconductor memory device having a multi-layered interlayer insulation consisting of deuterium and nitride

TOSHIBA KK9 citations74
US6969660B2Nov 29, 2005

Method of manufacturing a semiconductor device with trench isolation between two regions having different gate insulating films

TOSHIBA KK8 citations74
US7692969B2Apr 6, 2010

Nonvolatile semiconductor memory device including plural memory cells and a dummy cell coupled to an end of a memory cell

TOSHIBA KK4 citations73
US7371654B2May 13, 2008

Manufacturing method of semiconductor device with filling insulating film into trench

TOSHIBA KK8 citations73
US7364951B2Apr 29, 2008

Nonvolatile semiconductor memory device and method for manufacturing the same

TOSHIBA KK5 citations73
US7095085B2Aug 22, 2006

Nonvolatile semiconductor memory device and method for manufacturing the same

TOSHIBA KK5 citations73
US6747311B2Jun 8, 2004

Nonvolatile semiconductor memory device and method for manufacturing the same

TOSHIBA KK11 citations73
US5660956AAug 26, 1997

Reticle and method of fabricating reticle

TOSHIBA KK16 citations73
US5595844AJan 21, 1997

Method of exposing light in a method of fabricating a reticle

TOSHIBA KK12 citations73
US8837225B2Sep 16, 2014

Nonvolatile semiconductor memory device and operation method of the same

TOSHIBA KK3 citations63
US7026241B2Apr 11, 2006

Superconductor device and method of manufacturing the same

TOSHIBA KK4 citations63
US8879326B2Nov 4, 2014

Nonvolatile semiconductor memory device including plural memory cells and a dummy cell coupled to an end of a memory cell

TOSHIBA KK1 citations62
US7297599B2Nov 20, 2007

Method of fabricating semiconductor device

TOSHIBA KK6 citations62
US7195968B2Mar 27, 2007

Method of fabricating semiconductor device

TOSHIBA KK5 citations62
US6759314B1Jul 6, 2004

Method for manufacturing semiconductor devices using thermal nitride films as gate insulating films

TOSHIBA KK5 citations60
US8363480B2Jan 29, 2013

Nonvolatile semiconductor storage device

TOSHIBA KK1 citations52
US7238975B2Jul 3, 2007

Nonvolatile semiconductor memory device and manufacturing method therefor

TOSHIBA KK0 citations40

HAZAMA HIROAKI

5 patents