P

Inventor

SLEIGHT JEFFREY W

US261 patents
⚠️ This page may combine multiple inventors who share the name “SLEIGHT JEFFREY W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

24 patents
US7605429B2Oct 20, 2009

Hybrid crystal orientation CMOS structure for adaptive well biasing and for power and performance enhancement

IBM127 citations99
US7329923B2Feb 12, 2008

High-performance CMOS devices on hybrid crystal oriented substrates

IBM138 citations99
US8785981B1Jul 22, 2014

Non-replacement gate nanomesh field effect transistor with pad regions

IBM49 citations98
US7892945B2Feb 22, 2011

Nanowire mesh device and method of fabricating same

IBM97 citations98
US7893492B2Feb 22, 2011

Nanowire mesh device and method of fabricating same

IBM76 citations98
US7884004B2Feb 8, 2011

Maskless process for suspending and thinning nanowires

IBM51 citations98
US8018007B2Sep 13, 2011

Selective floating body SRAM cell

IBM34 citations96
US8778768B1Jul 15, 2014

Non-replacement gate nanomesh field effect transistor with epitixially grown source and drain

IBM89 citations95
US9287360B1Mar 15, 2016

III-V nanowire FET with compositionally-graded channel and wide-bandgap core

IBM22 citations93
US8928083B2Jan 6, 2015

Diode structure and method for FINFET technologies

IBM18 citations93
US8900959B2Dec 2, 2014

Non-replacement gate nanomesh field effect transistor with pad regions

IBM18 citations93
US8384065B2Feb 26, 2013

Gate-all-around nanowire field effect transistors

IBM34 citations93
US7538391B2May 26, 2009

Curved FINFETs

IBM28 citations93
US7274072B2Sep 25, 2007

Hybrid bulk-SOI 6T-SRAM cell for improved cell stability and performance

IBM33 citations93
US8012820B2Sep 6, 2011

Ultra-thin SOI CMOS with raised epitaxial source and drain and embedded SiGe PFET extension

IBM38 citations92
US6821833B1Nov 23, 2004

Method for separately optimizing thin gate dielectric of PMOS and NMOS transistors within the same semiconductor chip and device manufactured thereby

IBM46 citations92
US9812370B2Nov 7, 2017

III-V, SiGe, or Ge base lateral bipolar transistor and CMOS hybrid technology

IBM7 citations84
US9564514B2Feb 7, 2017

Reducing direct source-to-drain tunneling in field effect transistors with low effective mass channels

IBM5 citations84
US9536794B2Jan 3, 2017

Techniques for dual dielectric thickness for a nanowire CMOS technology using oxygen growth

IBM10 citations84
US9496338B2Nov 15, 2016

Wire-last gate-all-around nanowire FET

IBM6 citations84
US9449820B2Sep 20, 2016

Epitaxial growth techniques for reducing nanowire dimension and pitch

IBM7 citations84
US9391163B2Jul 12, 2016

Stacked planar double-gate lamellar field-effect transistor

IBM11 citations84
US9373638B1Jun 21, 2016

Complementary metal-oxide silicon having silicon and silicon germanium channels

IBM5 citations84
US9362354B1Jun 7, 2016

Tuning gate lengths in semiconductor device structures

IBM10 citations84

CHANG JOSEPHINE B

12 patents

BANGSARUNTIP SARUNYA

12 patents

GLOBALFOUNDRIES INC

2 patents

Showing the top 50 of 261 patents by PatentIndex Score.