Inventor
SLEIGHT JEFFREY W
US261 patents
⚠️ This page may combine multiple inventors who share the name “SLEIGHT JEFFREY W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
24 patentsUS7605429B2Oct 20, 2009
Hybrid crystal orientation CMOS structure for adaptive well biasing and for power and performance enhancement
IBM127 citations99
US7329923B2Feb 12, 2008
High-performance CMOS devices on hybrid crystal oriented substrates
IBM138 citations99
US8785981B1Jul 22, 2014
Non-replacement gate nanomesh field effect transistor with pad regions
IBM49 citations98
US7892945B2Feb 22, 2011
Nanowire mesh device and method of fabricating same
IBM97 citations98
US7893492B2Feb 22, 2011
Nanowire mesh device and method of fabricating same
IBM76 citations98
US7884004B2Feb 8, 2011
Maskless process for suspending and thinning nanowires
IBM51 citations98
US8018007B2Sep 13, 2011
Selective floating body SRAM cell
IBM34 citations96
US8778768B1Jul 15, 2014
Non-replacement gate nanomesh field effect transistor with epitixially grown source and drain
IBM89 citations95
US9287360B1Mar 15, 2016
III-V nanowire FET with compositionally-graded channel and wide-bandgap core
IBM22 citations93
US8928083B2Jan 6, 2015
Diode structure and method for FINFET technologies
IBM18 citations93
US8900959B2Dec 2, 2014
Non-replacement gate nanomesh field effect transistor with pad regions
IBM18 citations93
US8384065B2Feb 26, 2013
Gate-all-around nanowire field effect transistors
IBM34 citations93
US7538391B2May 26, 2009
Curved FINFETs
IBM28 citations93
US7274072B2Sep 25, 2007
Hybrid bulk-SOI 6T-SRAM cell for improved cell stability and performance
IBM33 citations93
US8012820B2Sep 6, 2011
Ultra-thin SOI CMOS with raised epitaxial source and drain and embedded SiGe PFET extension
IBM38 citations92
US6821833B1Nov 23, 2004
Method for separately optimizing thin gate dielectric of PMOS and NMOS transistors within the same semiconductor chip and device manufactured thereby
IBM46 citations92
US9812370B2Nov 7, 2017
III-V, SiGe, or Ge base lateral bipolar transistor and CMOS hybrid technology
IBM7 citations84
US9564514B2Feb 7, 2017
Reducing direct source-to-drain tunneling in field effect transistors with low effective mass channels
IBM5 citations84
US9536794B2Jan 3, 2017
Techniques for dual dielectric thickness for a nanowire CMOS technology using oxygen growth
IBM10 citations84
US9496338B2Nov 15, 2016
Wire-last gate-all-around nanowire FET
IBM6 citations84
US9449820B2Sep 20, 2016
Epitaxial growth techniques for reducing nanowire dimension and pitch
IBM7 citations84
US9391163B2Jul 12, 2016
Stacked planar double-gate lamellar field-effect transistor
IBM11 citations84
US9373638B1Jun 21, 2016
Complementary metal-oxide silicon having silicon and silicon germanium channels
IBM5 citations84
US9362354B1Jun 7, 2016
Tuning gate lengths in semiconductor device structures
IBM10 citations84
CHANG JOSEPHINE B
12 patentsUS8669615B1Mar 11, 2014
Techniques for metal gate workfunction engineering to enable multiple threshold voltage FINFET devices
CHANG JOSEPHINE B47 citations98
US8722472B2May 13, 2014
Hybrid CMOS nanowire mesh device and FINFET device
CHANG JOSEPHINE B40 citations94
US8536029B1Sep 17, 2013
Nanowire FET and finFET
CHANG JOSEPHINE B48 citations94
US8466012B1Jun 18, 2013
Bulk FinFET and SOI FinFET hybrid technology
CHANG JOSEPHINE B40 citations94
US8878298B2Nov 4, 2014
Multiple Vt field-effect transistor devices
CHANG JOSEPHINE B17 citations93
US8709888B2Apr 29, 2014
Hybrid CMOS nanowire mesh device and PDSOI device
CHANG JOSEPHINE B23 citations93
US8673731B2Mar 18, 2014
Techniques for gate workfunction engineering to reduce short channel effects in planar CMOS devices
CHANG JOSEPHINE B19 citations93
US8669167B1Mar 11, 2014
Techniques for metal gate workfunction engineering to enable multiple threshold voltage FINFET devices
CHANG JOSEPHINE B19 citations93
US8658518B1Feb 25, 2014
Techniques for metal gate work function engineering to enable multiple threshold voltage nanowire FET devices
CHANG JOSEPHINE B29 citations93
US8551833B2Oct 8, 2013
Double gate planar field effect transistors
CHANG JOSEPHINE B32 citations93
US8138030B2Mar 20, 2012
Asymmetric finFET device with improved parasitic resistance and capacitance
CHANG JOSEPHINE B21 citations93
US8110467B2Feb 7, 2012
Multiple Vt field-effect transistor devices
CHANG JOSEPHINE B24 citations93
BANGSARUNTIP SARUNYA
12 patentsUS8936972B2Jan 20, 2015
Epitaxially thickened doped or undoped core nanowire FET structure and method for increasing effective device width
BANGSARUNTIP SARUNYA29 citations94
US8809131B2Aug 19, 2014
Replacement gate fin first wire last gate all around devices
BANGSARUNTIP SARUNYA35 citations94
US8580624B2Nov 12, 2013
Nanowire FET and finFET hybrid technology
BANGSARUNTIP SARUNYA36 citations94
US8586966B2Nov 19, 2013
Contacts for nanowire field effect transistors
BANGSARUNTIP SARUNYA19 citations93
US8541774B2Sep 24, 2013
Hybrid CMOS technology with nanowire devices and double gated planar devices
BANGSARUNTIP SARUNYA18 citations93
US8455334B2Jun 4, 2013
Planar and nanowire field effect transistors
BANGSARUNTIP SARUNYA19 citations93
US8441043B2May 14, 2013
Maskless process for suspending and thinning nanowires
BANGSARUNTIP SARUNYA23 citations93
US8420455B2Apr 16, 2013
Generation of multiple diameter nanowire field effect transistors
BANGSARUNTIP SARUNYA17 citations93
US8324030B2Dec 4, 2012
Nanowire tunnel field effect transistors
BANGSARUNTIP SARUNYA17 citations93
US8324940B2Dec 4, 2012
Nanowire circuits in matched devices
BANGSARUNTIP SARUNYA18 citations93
US8173993B2May 8, 2012
Gate-all-around nanowire tunnel field effect transistors
BANGSARUNTIP SARUNYA35 citations93
US8097515B2Jan 17, 2012
Self-aligned contacts for nanowire field effect transistors
BANGSARUNTIP SARUNYA36 citations93
GLOBALFOUNDRIES INC
2 patentsShowing the top 50 of 261 patents by PatentIndex Score.