Inventor
YUEH WANG
US22 patents
⚠️ This page may combine multiple inventors who share the name “YUEH WANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INTEL CORP
11 patentsUS7005227B2Feb 28, 2006
One component EUV photoresist
INTEL CORP471 citations97
US7125793B2Oct 24, 2006
Method for forming an opening for an interconnect structure in a dielectric layer having a photosensitive material
INTEL CORP23 citations91
US7459260B2Dec 2, 2008
Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method
INTEL CORP9 citations83
US7678527B2Mar 16, 2010
Methods and compositions for providing photoresist with improved properties for contacting liquids
INTEL CORP11 citations82
US6864192B1Mar 8, 2005
Langmuir-blodgett chemically amplified photoresist
INTEL CORP11 citations72
US7147985B2Dec 12, 2006
Resist compounds including acid labile groups having hydrophilic groups attached thereto
INTEL CORP5 citations60
US7442487B2Oct 28, 2008
Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists
INTEL CORP0 citations51
US7226718B2Jun 5, 2007
Non-outgassing low activation energy resist
INTEL CORP0 citations51
US7867687B2Jan 11, 2011
Methods and compositions for reducing line wide roughness
INTEL CORP1 citations50
US7427463B2Sep 23, 2008
Photoresists with reduced outgassing for extreme ultraviolet lithography
INTEL CORP0 citations50
US7147986B2Dec 12, 2006
Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages
INTEL CORP1 citations50
SHIPLEY CO LLC
10 patentsUS6306554B1Oct 23, 2001
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
SHIPLEY CO LLC89 citations98
US6680159B2Jan 20, 2004
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
SHIPLEY CO LLC41 citations96
US6492086B1Dec 10, 2002
Phenolic/alicyclic copolymers and photoresists
SHIPLEY CO LLC46 citations96
US6406828B1Jun 18, 2002
Polymer and photoresist compositions
SHIPLEY CO LLC39 citations96
US6599677B2Jul 29, 2003
Polymer and photoresist compositions
SHIPLEY CO LLC15 citations92
US6849381B2Feb 1, 2005
Copolymers and photoresist compositions comprising same
SHIPLEY CO LLC12 citations82
US6777157B1Aug 17, 2004
Copolymers and photoresist compositions comprising same
SHIPLEY CO LLC6 citations72
US7105266B2Sep 12, 2006
Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
SHIPLEY CO LLC1 citations63
US7118847B2Oct 10, 2006
Polymer and photoresist compositions
SHIPLEY CO LLC0 citations52
US7022454B2Apr 4, 2006
Monomers, polymers, methods of synthesis thereof and photoresist compositions
SHIPLEY CO LLC0 citations40