Inventor
KIM CHUNG-WOO
KR38 patents
⚠️ This page may combine multiple inventors who share the name “KIM CHUNG-WOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
31 patentsUS7646041B2Jan 12, 2010
Non-volatile memory devices including vertical channels, methods of operating, and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD59 citations98
US7391075B2Jun 24, 2008
Non-volatile semiconductor memory device with alternative metal gate material
SAMSUNG ELECTRONICS CO LTD70 citations98
US6936884B2Aug 30, 2005
Nonvolatile silicon/oxide/nitride/silicon/nitride/oxide/silicon memory
SAMSUNG ELECTRONICS CO LTD67 citations97
US6946703B2Sep 20, 2005
SONOS memory device having side gate stacks and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD83 citations95
US7345898B2Mar 18, 2008
Complementary nonvolatile memory device
SAMSUNG ELECTRONICS CO LTD22 citations92
US7187030B2Mar 6, 2007
SONOS memory device
SAMSUNG ELECTRONICS CO LTD21 citations92
US7053448B2May 30, 2006
SONOS type memory device
SAMSUNG ELECTRONICS CO LTD30 citations92
US6930343B2Aug 16, 2005
Nonvolatile memory device utilizing a vertical nanotube
SAMSUNG ELECTRONICS CO LTD28 citations92
US7250653B2Jul 31, 2007
SONOS memory device having nano-sized trap elements
SAMSUNG ELECTRONICS CO LTD21 citations91
US7456468B2Nov 25, 2008
Semiconductor device including high-k insulating layer and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD16 citations84
US7420256B2Sep 2, 2008
Nonvolatile semiconductor memory device having a gate stack and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD18 citations84
US7402492B2Jul 22, 2008
Method of manufacturing a memory device having improved erasing characteristics
SAMSUNG ELECTRONICS CO LTD17 citations84
US7202521B2Apr 10, 2007
Silicon-oxide-nitride-oxide-silicon (SONOS) memory device and methods of manufacturing and operating the same
SAMSUNG ELECTRONICS CO LTD19 citations84
US7105874B2Sep 12, 2006
Single electron transistor having memory function
SAMSUNG ELECTRONICS CO LTD14 citations84
US7629244B2Dec 8, 2009
Method of fabricating a single electron transistor having memory function
SAMSUNG ELECTRONICS CO LTD6 citations74
US7439574B2Oct 21, 2008
Silicon/oxide/nitride/silicon nonvolatile memory with vertical channels
SAMSUNG ELECTRONICS CO LTD8 citations74
US7411261B2Aug 12, 2008
MEMS device and fabrication method thereof
SAMSUNG ELECTRONICS CO LTD5 citations74
US7858464B2Dec 28, 2010
Methods of manufacturing non-volatile memory devices having insulating layers treated using neutral beam irradiation
SAMSUNG ELECTRONICS CO LTD7 citations73
US6479365B2Nov 12, 2002
Single electron transistor using porous silicon and manufacturing method thereof
SAMSUNG ELECTRONICS CO LTD13 citations73
US6414333B1Jul 2, 2002
Single electron transistor using porous silicon
SAMSUNG ELECTRONICS CO LTD9 citations73
US7349262B2Mar 25, 2008
Methods of programming silicon oxide nitride oxide semiconductor (SONOS) memory devices
SAMSUNG ELECTRONICS CO LTD7 citations72
US7374991B2May 20, 2008
SONOS memory device having side gate stacks and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD6 citations71
US7432554B2Oct 7, 2008
CMOS thin film transistor comprising common gate, logic device comprising the CMOS thin film transistor, and method of manufacturing the CMOS thin film transistor
SAMSUNG ELECTRONICS CO LTD5 citations63
US6720201B2Apr 13, 2004
MEMS device and fabrication method thereof
SAMSUNG ELECTRONICS CO LTD3 citations63
US7719871B2May 18, 2010
Methods of operating and manufacturing logic device and semiconductor device including complementary nonvolatile memory device, and reading circuit for the same
SAMSUNG ELECTRONICS CO LTD1 citations62
US7531870B2May 12, 2009
SONOS memory device having nano-sized trap elements
SAMSUNG ELECTRONICS CO LTD3 citations61
US7670916B2Mar 2, 2010
Semiconductor device doped with Sb, Ga, or Bi and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD1 citations52
US7531865B2May 12, 2009
Semiconductor device doped with Sb, Ga or Bi and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US7358137B2Apr 15, 2008
Memory devices including barrier layers and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD1 citations52
US7825459B2Nov 2, 2010
Method of operating a SONOS memory device
SAMSUNG ELECTRONICS CO LTD0 citations51
US7759196B2Jul 20, 2010
Multi-bit non-volatile memory device, method of operating the same, and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations42