P

Inventor

LIN CHENG-CHUNG

TW48 patents
⚠️ This page may combine multiple inventors who share the name “LIN CHENG-CHUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG

21 patents
US7176137B2Feb 13, 2007

Method for multiple spacer width control

TAIWAN SEMICONDUCTOR MFG101 citations98
US6372661B1Apr 16, 2002

Method to improve the crack resistance of CVD low-k dielectric constant material

TAIWAN SEMICONDUCTOR MFG60 citations96
US6407013B1Jun 18, 2002

Soft plasma oxidizing plasma method for forming carbon doped silicon containing dielectric layer with enhanced adhesive properties

TAIWAN SEMICONDUCTOR MFG43 citations93
US6383935B1May 7, 2002

Method of reducing dishing and erosion using a sacrificial layer

TAIWAN SEMICONDUCTOR MFG45 citations93
US6943077B2Sep 13, 2005

Selective spacer layer deposition method for forming spacers with different widths

TAIWAN SEMICONDUCTOR MFG24 citations92
US6746900B1Jun 8, 2004

Method for forming a semiconductor device having high-K gate dielectric material

TAIWAN SEMICONDUCTOR MFG17 citations84
US6645864B1Nov 11, 2003

Physical vapor deposition of an amorphous silicon liner to eliminate resist poisoning

TAIWAN SEMICONDUCTOR MFG18 citations84
US9378926B2Jun 28, 2016

Electron beam lithography methods including time division multiplex loading

TAIWAN SEMICONDUCTOR MFG10 citations83
US8941085B2Jan 27, 2015

Electron beam lithography systems and methods including time division multiplex loading

TAIWAN SEMICONDUCTOR MFG9 citations83
US6955984B2Oct 18, 2005

Surface treatment of metal interconnect lines

TAIWAN SEMICONDUCTOR MFG12 citations81
US7271103B2Sep 18, 2007

Surface treated low-k dielectric as diffusion barrier for copper metallization

TAIWAN SEMICONDUCTOR MFG8 citations74
US9287171B2Mar 15, 2016

Method of making a conductive pillar bump with non-metal sidewall protection structure

TAIWAN SEMICONDUCTOR MFG3 citations73
US6794295B1Sep 21, 2004

Method to improve stability and reliability of CVD low K dielectric

TAIWAN SEMICONDUCTOR MFG6 citations63
US8053894B2Nov 8, 2011

Surface treatment of metal interconnect lines

TAIWAN SEMICONDUCTOR MFG3 citations62
US8592300B2Nov 26, 2013

Interface structure for copper-copper peeling integrity

TAIWAN SEMICONDUCTOR MFG2 citations57
US6197706B1Mar 6, 2001

Low temperature method to form low k dielectric

TAIWAN SEMICONDUCTOR MFG4 citations57
US9281288B2Mar 8, 2016

System and method for fine pitch PoP structure

TAIWAN SEMICONDUCTOR MFG1 citations52
US8344506B2Jan 1, 2013

Interface structure for copper-copper peeling integrity

TAIWAN SEMICONDUCTOR MFG0 citations52
US9202662B2Dec 1, 2015

Charged particle lithography system with a long shape illumination beam

TAIWAN SEMICONDUCTOR MFG0 citations51
US9286970B2Mar 15, 2016

Memory circuit for pre-charging and write driving

TAIWAN SEMICONDUCTOR MFG1 citations50
US7011929B2Mar 14, 2006

Method for forming multiple spacer widths

TAIWAN SEMICONDUCTOR MFG0 citations42

TAIWAN SEMICONDUCTOR MFG CO LTD

7 patents

LIN CHENG-CHUNG

4 patents

HWANG CHIEN LING

4 patents

VIA LABS INC

3 patents

WU YI-WEN

2 patents

SUN SHINE LIN IND CO LTD

2 patents

LIU CHUNG-SHI

1 patent

(unassigned)

1 patent

YANG PING-LIN

1 patent

CHENG MING-DA

1 patent

HUANG CHUN-HUI

1 patent