Inventor

YANG YIXIONG

US59 patents

⚠️ This page may combine multiple inventors who share the name “YANG YIXIONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YANG YIXIONG

APPLIED MATERIALS INC

Thermal process chamber lid with backside pumping

Atomic layer deposition chamber with thermal lid

Seamless gap fill

Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof

Low resistivity DRAM buried word line stack

P-type dipole for p-FET

Low resistivity DRAM buried word line stack

Thermal process chamber lid with backside pumping

P-type dipole for p-FET

Integrated dipole flow for transistor

Methods for selective deposition of metal silicides via atomic layer deposition cycles

Methods for etching via atomic layer deposition (ALD) cycles

Treatments to enhance material structures

Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plate

Low resistivity metal contact stack

Thermal process chamber lid with backside pumping

Metal based hydrogen barrier

MOSFET gate engineerinng with dipole films

Threshold voltage modulation for gate-all-around FET architecture

PMOS high-k metal gates

Metal based hydrogen barrier

P-type dipole for P-FET

Electronic device having an oxygen free platinum group metal film

Methods of forming molybdenum contacts

PMOS high-K metal gates

Oxygen free deposition of platinum group metal films

Methods for forming impurity free metal alloy films

Fluorine-doped nitride films for improved high-k reliability

Method of reducing effective oxide thickness in a semiconductor structure

Tuning work function of p-metal work function films through vapor deposition

Method of tuning film properties of metal nitride using plasma

Liner for V-NAND word line stack

Integrated dipole region for transistor

Amorphous silicon-based scavenging and sealing EOT

V-NAND stacks with dipole regions

Treatments to enhance material structures

Treatments to enhance material structures

Integrated dipole flow for transistor

Methods for reflector film growth

Method of tuning film properties of metal nitride using plasma

Liner for V-NAND word line stack

Methods and apparatus for processing a substrate

Lids and lid assembly kits for atomic layer deposition chambers

Methods of forming semiconductor structures

Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursors

In-situ tungsten deposition without barrier layer

Aluminum content control of TiAIN films

Conformal molybdenum deposition

Integrated dipole region for transistor

UNIV HUAZHONG SCIENCE TECH

Method and system for evaluating fractal dimension of particle matter in dispersing system