Inventor
NARA KEI
JP43 patents
⚠️ This page may combine multiple inventors who share the name “NARA KEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
32 patentsUS6204912B1Mar 20, 2001
Exposure method, exposure apparatus, and mask
NIKON CORP90 citations97
US5602620AFeb 11, 1997
Scanning exposure apparatus and exposure method
NIKON CORP63 citations96
US5617211AApr 1, 1997
Exposure apparatus
NIKON CORP60 citations95
US6141082AOct 31, 2000
Alignment method, exposure method, and exposure apparatus
NIKON CORP16 citations92
US5999244ADec 7, 1999
Projection exposure apparatus, method for correcting positional discrepancy of projected image, and method for determining image formation characteristic of projection optical system
NIKON CORP36 citations92
US5912726AJun 15, 1999
Projection exposure apparatus and method having a positional deviation detection system that employs light from an exposure illumination system
NIKON CORP47 citations92
US5850279ADec 15, 1998
Alignment method, projection exposure method, and projection exposure apparatus
NIKON CORP37 citations92
US5849441ADec 15, 1998
Alignment method utilizing plurality of marks, discriminable from each other, capable of effecting alignment individually
NIKON CORP20 citations92
US5777722AJul 7, 1998
Scanning exposure apparatus and method
NIKON CORP39 citations92
US5760881AJun 2, 1998
Exposure apparatus with light shielding portion for plotosensitive elements
NIKON CORP42 citations92
US5668624ASep 16, 1997
Scan type exposure apparatus
NIKON CORP24 citations92
US5623343AApr 22, 1997
Exposure method and apparatus
NIKON CORP27 citations92
US5523841AJun 4, 1996
Distance measuring apparatus using multiple switched interferometers
NIKON CORP29 citations92
US5973766AOct 26, 1999
Exposure method and exposure device
NIKON CORP34 citations91
US6437354B1Aug 20, 2002
Exposure method and scanning-type exposure apparatus
NIKON CORP11 citations74
US6342943B1Jan 29, 2002
Exposure apparatus
NIKON CORP8 citations74
US6049372AApr 11, 2000
Exposure apparatus
NIKON CORP10 citations74
US5726757AMar 10, 1998
Alignment method
NIKON CORP11 citations74
US6239861B1May 29, 2001
Exposure method and scanning type exposure apparatus
NIKON CORP10 citations73
US5978094ANov 2, 1999
Alignment device and method based on imaging characteristics of the image pickup system
NIKON CORP16 citations73
US5793472AAug 11, 1998
Exposure method using reference marks on both the mask and the substrate and capable of providing high alignment precision even after multiple exposures
NIKON CORP9 citations73
US10246287B2Apr 2, 2019
Processing system and device manufacturing method
NIKON CORP2 citations72
US6341011B1Jan 22, 2002
Exposure method
NIKON CORP5 citations63
US5838449ANov 17, 1998
Optical apparatus
NIKON CORP4 citations63
US5565988AOct 15, 1996
Alignment method and apparatus
NIKON CORP5 citations61
US10832977B2Nov 10, 2020
Display element manufacturing method and manufacturing apparatus
NIKON CORP0 citations52
US9917023B2Mar 13, 2018
Display element manufacturing method and manufacturing apparatus
NIKON CORP0 citations52
US9310656B2Apr 12, 2016
Method for manufacturing display element, manufacturing apparatus of display element and display device
NIKON CORP0 citations52
US8926387B2Jan 6, 2015
Defect detection method of display device and defect detection apparatus of display device
NIKON CORP1 citations52
US10683185B2Jun 16, 2020
Processing system and device manufacturing method
NIKON CORP0 citations51
US10438814B2Oct 8, 2019
Method for manufacturing wiring pattern, method for manufacturing transistor, and member for transfer
NIKON CORP0 citations51
US8349672B2Jan 8, 2013
Display element manufacturing method and manufacturing apparatus, thin film transistor manufacturing method and manufacturing apparatus, and circuit forming apparatus
NIKON CORP0 citations42
NARA KEI
6 patentsUS8917378B2Dec 23, 2014
Exposure method, exposure apparatus, and method for producing device with plurality of projection optical systems and pattern having first partial pattern area and second partial area having overlaid area with first partial pattern area
NARA KEI5 citations72
US8432528B2Apr 30, 2013
Method for manufacturing display element, manufacturing apparatus of display element and display device
NARA KEI5 citations72
US9178155B2Nov 3, 2015
Flexible substrate, manufacturing method of display element, and manufacturing apparatus of display element
NARA KEI0 citations51
US8456617B2Jun 4, 2013
Exposure method, exposure device, and micro device manufacturing method
NARA KEI0 citations51
US8301289B2Oct 30, 2012
Defect detection method of display device and defect detection apparatus of display device
NARA KEI0 citations51
US8262974B2Sep 11, 2012
Method for manufacturing display element and manufacturing apparatus of display element
NARA KEI0 citations51