Scanning exposure apparatus and exposure method

Abstract

The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.

What is claimed is:  
     
       1. A scanning exposure apparatus for transferring a pattern on a mask onto a photosensitive substrate, comprising: 
       a plurality of illumination optical systems for illuminating a plurality of regions on said mask, respectively;  
       a first optical system having a plurality of projection optical systems optical axes of which are arranged in parallel with one another, perpendicular to a first direction, and in a plane which is parallel with said first direction;  
       a second optical system having a plurality of projection optical systems optical axes of which are arranged in parallel with the optical axes of the projection optical systems of said first optical system and are arranged in a line a predetermined distance apart from the line along which optical axes of the projection optical systems of said first optical system are arranged, some of images of the plurality of regions on said mask and the rest of the images being simultaneously projected through said first optical system and said second optical system, respectively, onto said substrate;  
       a scanning mechanism for moving said mask and said substrate synchronously in a direction approximately perpendicular to said first direction and in the place of said substrate, thereby said mask and said substrate being scanned;  
       a rotating mechanism for effecting relative rotation between said mask and said substrate in the plane of one of said mask and said substrate;  
       a position changing mechanism for changing relative positions of said mask and said substrate in said first direction in accordance with a position in a direction of the scanning of one of said mask and said substrate; and  
       an image position changing mechanism for relatively changing positions of the images projected through said first optical system and positions of the images projected through said second optical system in said first direction.  
     
     
       2. A scanning exposure apparatus according to  claim 1 , wherein the relative change by said image position changing mechanism is performed based on a deviation of angle of a first coordinate system concerning an arrangement of the pattern formed on said mask with respect to a second coordinate system determined by the scanning direction and a direction perpendicular to said scanning direction. 
     
     
       3. A scanning exposure apparatus according to  claim 1 , wherein first images of the pattern on said mask are preliminarily formed on said substrate, and second images of the pattern on said mask are then to be projected for exposure as overlapping with said first images, 
       and wherein the relative change of the positions of said second images by said image position changing mechanism is performed based on a deviation of angle of a first coordinate system concerning an arrangement of said first images with respect to a second coordinate system determined by the scanning direction and a direction perpendicular to said scanning direction.  
     
     
       4. A scanning exposure apparatus according to  claim 1 , wherein first images of the pattern on said mask are preliminarily formed on said substrate, and second images of the pattern on said mask are then to be projected for exposure as overlapping with said first images, 
       and wherein the relative change of the positions of said second images by said image position changing mechanism is performed based on a deviation of angle of a first coordinate system concerning an arrangement of the pattern on said mask with respect to a second coordinate system concerning an arrangement of said first images.  
     
     
       5. A scanning exposure apparatus for transferring a pattern on a mask onto a photosensitive substrate, comprising: 
       a plurality of illumination optical systems for illuminating a plurality of regions on said mask, respectively;  
       a first optical system having a plurality of projection optical systems optical axes of which are arranged in parallel with one another, perpendicular to a first direction, and in a plane which is parallel with said first direction;  
       a second optical system having a plurality of projection optical systems optical axes of which are arranged in parallel with the optical axes of the projection optical systems of said first optical system and are arranged in a line a predetermined distance apart from the line along which optical axes of the projection optical systems of the first optical system are arranged, some of images of the plurality of regions on said mask and the rest of the images being projected through said first optical system and said second optical system, respectively, onto said substrate;  
       a scanning mechanism for moving said mask and said substrate synchronously in a direction approximately perpendicular to said first direction and in the plane of said substrate, thereby said mask and said substrate being scanned; and  
       an image position changing mechanism for changing, by a predetermined angle, arrangement directions of the images projected through said first optical system and said second optical system relative to said first direction, changing an interval between the images projected through said first optical system and an interval between the images projected through said second optical system, and changing positions of the respective images in a rotational direction with respect to the optical axes of the projection optical systems of said first optical system and said second optical systems.  
     
     
       6. A scanning exposure apparatus according to  claim 5 , wherein first images of the pattern on said mask are preliminarily formed on said substrate, and second images of the pattern on said mask are then to be projected for exposure as overlapping with said first images, 
       and wherein said image position changing mechanism performs the changing of arrangement directions, the changing of image intervals, and the changing of positions in the rotational direction, based on a deviation of angle of a first coordinate system concerning an arrangement of said first images with respect to a second coordinate system determined by a direction of the scanning and a direction perpendicular to said scanning direction.  
     
     
       7. A scanning exposure apparatus according to  claim 5 , wherein first images of the pattern on said mask are preliminarily formed on said substrate, and second images of the pattern on said mask are then to be projected for exposure as overlapping with said first images, 
       and wherein said image position changing mechanism performs the changing of arrangement directions, the changing of image intervals, and the changing of positions in the rotational direction, based on a deviation of angle of a first coordinate system concerning an arrangement of the pattern on said mask with respect to a second coordinate system concerning an arrangement of said first images.  
     
     
       8. An exposure method carried out by a scanning exposure apparatus comprising a plurality of illumination optical systems for illuminating a plurality of regions on a mask with a pattern formed thereon, respectively; a first optical system having a plurality of projection optical systems optical axes of which are arranged in parallel with one another, perpendicular to a first direction, and in a plane which is parallel with said first direction; a second optical system having a plurality of projection optical systems optical axes of which are arranged in parallel with the optical axes of the projection optical systems of said first optical system and are arranged in a line a predetermined distance apart from the line along which optical axes of the projection optical systems of said first optical system are arranged, some of images of the plurality of regions on said mask and the rest of the images being projected through said first optical system and said second optical system, respectively, onto said substrate; and a scanning mechanism for moving said mask and said substrate synchronously in a direction approximately perpendicular to said first direction and in the plane of said substrate, thereby said mask and said substrate being scanned, comprising: 
       a rotating process for relatively rotating said mask and said substrate within the plane of one of said mask and said substrate;  
       a position changing process for changing relative positions of said mask and said substrate in said first direction in accordance with a position of one of said mask and said substrate in a direction of the scanning; and  
       an image position changing process for relatively changing positions of the images projected through said first optical system and positions of the images projected through said second optical system in said first direction.  
     
     
       9. An exposure method according to  claim 8 , wherein said image position changing process is arranged to effect the relative change, based on a deviation of angle of a first coordinate system concerning an arrangement of the pattern formed on said mask with respect to a second coordinate system determined by a direction of the scanning and a direction perpendicular to the scanning direction. 
     
     
       10. An exposure method according to  claim 8 , wherein first images of the pattern on said mask are preliminarily formed on said substrate, and second images of the pattern on said mask are then to be projected for exposure as overlapping with said first images, 
       and wherein said image position changing process is to effect the relative change, based on a deviation of angle of a first coordinate system concerning an arrangement of said first images with respect to a second coordinate system determined by a direction of the scanning and a direction perpendicular to the scanning direction.  
     
     
       11. An exposure method according to  claim 8 , wherein first images on the pattern on said mask are preliminarily formed on said substrate, and second images of the pattern on said mask are then to be projected for exposure as overlapping with said first images, 
       and wherein said image position changing process is to effect the relative change, based on a deviation of angle of a first coordinate system concerning an arrangement of the pattern on said mask with respect to a second coordinate system concerning an arrangement of said first images.  
     
     
       12. An exposure method carried out by a scanning exposure apparatus comprising a plurality of illumination optical systems for illuminating a plurality of regions on a mask with a pattern formed thereon, respectively; a first optical system having a plurality of projection optical systems optical axes of which are arranged in parallel with one another, perpendicular to a first direction, and in a plane which is parallel with said first direction; a second optical system having a plurality of projection optical systems optical axes of which are arranged in parallel with the optical axes of the projection optical systems of said first optical system and are arranged in a line a predetermined distance apart from the line along which optical axes of the projection optical systems of said first optical system are arranged, some of images of the plurality of regions on said mask and the rest of the images being projected through said first optical system and said second optical system, respectively, onto said substrate; and a scanning mechanism for moving said mask and said substrate synchronously in a direction approximately perpendicular to said first direction and in the plane of said substrate, thereby said mask and said substrate being scanned, 
       said exposure method comprising an image position changing process for changing, by a predetermined angle, arrangement directions of the images projected through said first optical system and said second optical system relative to said first direction, changing an interval between the images projected through said first optical system and an interval between the images projected through said second optical system, and changing positions of the respective images in a rotational direction with respect to the optical axes of the projection optical systems of said first optical system and said second optical system.  
     
     
       13. An exposure method according to  claim 12 , wherein first images of the pattern on said mask are preliminarily formed on said substrate, and second images of the pattern on said mask are then to be projected for exposure as overlapping with said first images, 
       and wherein said image position changing process is to effect the changing of arrangement directions, the changing of image intervals, and the changing of positions in the rotational direction, based on a deviation of angle of a first coordinate system concerning an arrangement of said first images with respect to a second coordinate system determined by a direction of the scanning and a direction perpendicular to the scanning direction.  
     
     
       14. An exposure method according to  claim 12 , wherein first images of the pattern on said mask are preliminarily formed on said substrate, and second images of the pattern on said mask are then to be projected for exposure as overlapping with said first images, 
       and wherein said image position changing process is to effect the changing of arrangement directions, the changing of image intervals, and the changing of positions in the rotational direction, based on a deviation of angle of a first coordinate system concerning an arrangement of the pattern on said mask with respect to a second coordinate system concerning an arrangement of said first images.  
     
     
       15. A scanning exposure apparatus comprising: 
       
         a carriage integrally holding a mask and a substrate;  
       
         a sub - stage provided on the carriage, the sub - stage being driven to adjust relative positions of the mask and of the substrate while the mask and the substrate are integrally held by the carriage; and    
       
         an image transfer system that transfers a pattern on the mask onto the substrate by using a transfer area having an oblique portion, the image transfer system overlapping portions of the pattern utilizing the oblique portion of the transfer area while moving the mask and the substrate synchronously. 
       
     
     
       16. The scanning exposure apparatus of  claim 15 , wherein the sub- stage is integral with the carriage, and remains integral with the carriage and moves with the carriage while the sub - stage adjusts the relative positions of the mask and of the substrate.   
     
     
       17. A scanning exposure apparatus comprising: 
       
         a carriage integrally holding a mask and a substrate;  
       
         a sub - stage provided on the carriage, the sub - stage arranged to adjust relative positions of the mask and of the substrate;    
       
         a projection optical system arranged between the mask and the substrate;  
       
       
         an imagery characteristic correction mechanism that adjusts an optical imaging characteristic of the projection optical system; and  
       
       
         an image transfer system that transfers a pattern on the mask onto the substrate by using a transfer area having an oblique portion, the image transfer system overlapping portions of the pattern utilizing the oblique portion of the transfer area while moving the mask and the substrate synchronously. 
       
     
     
       18. The scanning exposure apparatus of  claim 17 , wherein the sub- stage adjusts the relative positions of the mask and of the substrate while the mask and the substrate are integrally held by the carriage.   
     
     
       19. The scanning exposure apparatus of  claim 17 , wherein the sub- stage is integral with the carriage, and remains integral with the carriage and moves with the carriage while the sub - stage adjusts the relative positions of the mask and of the substrate.   
     
     
       20. A scanning exposure apparatus comprising: 
       
         a carriage integrally holding a mask and a substrate;  
       
         sub - stage provided on the carriage, the sub - stage arranged to adjust relative positions of the mask and of the substrate, the sub - stage being driven during scanning exposure of the substrate to an image of a pattern on the mask; and    
       
         an image transfer system that transfers the pattern on the mask onto the substrate by using a transfer area having an oblique portion, the image transfer system overlapping portions of the pattern utilizing the oblique portion of the transfer area while moving the mask and the substrate synchronously. 
       
     
     
       21. The scanning exposure apparatus of  claim 20 , wherein the sub- stage adjusts the relative positions of the mask and of the substrate while the mask and the substrate are integrally held by the carriage.   
     
     
       22. The scanning exposure apparatus of  claim 21 , further comprising: 
       
         a projection optical system arranged between the mask and the substrate; and  
       
       
         an imagery characteristic correction mechanism that adjusts an optical imaging characteristic of the projection optical system. 
       
     
     
       23. The scanning exposure apparatus of  claim 20 , further comprising: 
       
         a projection optical system arranged between the mask and the substrate; and  
       
       
         an imagery characteristic correction mechanism that adjusts an optical imaging characteristic of the projection optical system. 
       
     
     
       24. The scanning exposure apparatus of  claim 20 , wherein the sub- stage is integral with the carriage, and remains integral with the carriage and moves with the carriage while the sub - stage adjusts the relative positions of the mask and of the substrate.   
     
     
       25. A method of making a scanning exposure apparatus comprising the steps of: 
       
         providing a carriage that integrally holds a mask and a substrate;  
       
         providing a sub - stage on the carriage, the sub - stage being driven to adjust relative positions of the mask and of the substrate while the mask and the substrate are integrally held by the carriage; and    
       
         providing an image transfer system that transfers a pattern on the mask onto the substrate by using a transfer area having an oblique portion, the image transfer system overlapping portions of the pattern utilizing the oblique portion of the transfer area while moving the mask and the substrate synchronously. 
       
     
     
       26. The method of  claim 25 , wherein the sub- stage is provided so as to be integral with the carriage, and remains integral with the carriage and moves with the carriage while the sub - stage adjusts the relative positions of the mask and of the substrate.   
     
     
       27. A method of making a scanning exposure apparatus comprising the steps of: 
       
         providing a carriage that integrally holds a mask and a substrate;  
       
         providing a sub - stage on the carriage, the sub - stage arranged to adjust relative positions of the mask and of the substrate;    
       
         providing a projection optical system between the mask and the substrate;  
       
       
         providing an imagery characteristic correction mechanism that adjusts an optical imaging characteristic of the projection optical system; and  
       
       
         providing an image transfer system that transfers a pattern on the mask onto the substrate by using a transfer area having an oblique portion, the image transfer system overlapping portions of the pattern utilizing the oblique portion of the transfer area while moving the mask and the substrate synchronously. 
       
     
     
       28. The method of  claim 27 , wherein the sub- stage adjusts the relative positions of the mask and of the substrate while the mask and the substrate are integrally held by the carriage.   
     
     
       29. The method of  claim 27 , wherein the sub- stage is provided so as to be integral with the carriage, and remains integral with the carriage and moves with the carriage while the sub - stage adjusts the relative positions of the mask and of the substrate.   
     
     
       30. A method of making a scanning exposure apparatus comprising the steps of: 
       
         providing a carriage that integrally holds a mask and a substrate;  
       
         providing a sub - stage on the carriage, the sub - stage arranged to adjust relative positions of the mask and of the substrate, the sub - stage being driven during scanning exposure of the substrate to an image of a pattern on the mask; and    
       
         providing an image transfer system that transfers the pattern on the mask onto the substrate by using a transfer area having an oblique portion, the image transfer system overlapping portions of the pattern utilizing the oblique portion of the transfer area while moving the mask and the substrate synchronously. 
       
     
     
       31. The method of  claim 30 , wherein the sub- stage adjusts the relative positions of the mask and of the substrate while the mask and the substrate are integrally held by the carriage.   
     
     
       32. The method of  claim 31 , further comprising the steps of: 
       
         providing a projection optical system between the mask and the substrate; and  
       
       
         providing an imagery characteristic correction mechanism that adjusts an optical imaging characteristic of the projection of optical system. 
       
     
     
       33. The method of  claim 30 , further comprising the steps of: 
       
         providing a projection optical system between the mask and the substrate; and  
       
       
         providing an imagery characteristic correction mechanism that adjusts an optical imaging characteristic of the projection optical system. 
       
     
     
       34. The method of  claim 30 , wherein the sub- stage is provided so as to be integral with the carriage, and remains integral with the carriage and moves with the carriage while the sub - stage adjusts the relative positions of the mask and of the substrate.   
     
     
       35. A method of performing exposure with a scanning exposure apparatus comprising the steps of: 
       
         integrally holding a mask and a substrate on a carriage;  
       
         driving a sub - stage that is provided on the carriage to adjust relative positions of the mask and of the substrate while the mask and the substrate are integrally held by the carriage; and    
       
         transferring a pattern on the mask onto the substrate by using a transfer area having an oblique portion, portions of the pattern being overlapped utilizing the oblique portion of the transfer area while moving the mask and the substrate synchronously. 
       
     
     
       36. The method of  claim 35 , further comprising the step of: 
         maintaining the sub - stage integral with the carriage while the sub - stage adjusts the relative positions of the mask and of the substrate.   
     
     
       37. A method of performing exposure with a scanning exposure apparatus comprising the steps of: 
       
         integrally holding a mask and a substrate on a carriage;  
       
         driving a sub - stage that is provided on the carriage to adjust relative positions of the mask and of the substrate;    
       
         adjusting an optical imaging characteristic of a projection optical system that is arranged between the mask and the substrate; and  
       
       
         transferring a pattern on the mask onto the substrate by using a transfer area having an oblique portion, portions of the pattern being overlapped utilizing the oblique portion of the transfer area while moving the mask and the substrate synchronously. 
       
     
     
       38. The method of  claim 37 , wherein the step of driving the sub- stage to adjust the relative positions of the mask and of the substrate is performed while the mask and the substrate are integrally held by the carriage.   
     
     
       39. The method of  claim 37 , further comprising the step of: 
         maintaining the sub - stage integral with the carriage while the sub - stage adjusts the relative positions of the mask and of the substrate.   
     
     
       40. A method of performing exposure with a scanning exposure apparatus comprising the steps of: 
       
         integrally holding a mask and a substrate on a carriage;  
       
         driving a sub - stage that is provided on the carriage to adjust relative positions of the mask and of the substrate during scanning exposure of the substrate to an image of a pattern on the mask; and    
       
         transferring the pattern on the mask onto the substrate by using a transfer area having an oblique portion, portions of the pattern being overlapped utilizing the oblique portion of the transfer area while moving the mask and the substrate synchronously. 
       
     
     
       41. The method of  claim 40 , wherein the step of driving the sub- stage to adjust the relative positions of the mask and of the substrate is performed while the mask and the substrate are integrally held by the carriage.   
     
     
       42. The method of  claim 41 , further comprising the step of: 
       
         adjusting an optical imaging characteristic of a projection optical system that is arranged between the mask and the substrate. 
       
     
     
       43. The method of  claim 40 , further comprising the step of: 
       
         adjusting an optical imaging characteristic of a projection optical system that is arranged between the mask and the substrate. 
       
     
     
       44. The method of  claim 40 , further comprising the step of: 
         maintaining the sub - stage integral with the carriage while the sub - stage adjusts the relative positions of the mask and of the substrate.