P

Inventor

KAKIMOTO AKINOBU

JP33 patents
⚠️ This page may combine multiple inventors who share the name “KAKIMOTO AKINOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

24 patents
US8946065B2Feb 3, 2015

Method of forming seed layer and method of forming silicon-containing thin film

TOKYO ELECTRON LTD9 citations84
US9797067B2Oct 24, 2017

Selective epitaxial growth method and film forming apparatus

TOKYO ELECTRON LTD2 citations73
US9758865B2Sep 12, 2017

Silicon film forming method, thin film forming method and cross-sectional shape control method

TOKYO ELECTRON LTD4 citations73
US9263250B2Feb 16, 2016

Method and apparatus of forming silicon nitride film

TOKYO ELECTRON LTD3 citations73
US8895414B1Nov 25, 2014

Method and apparatus for forming amorphous silicon film

TOKYO ELECTRON LTD4 citations73
US11786946B2Oct 17, 2023

Cleaning method and film forming apparatus

TOKYO ELECTRON LTD4 citations72
US10460950B2Oct 29, 2019

Substrate processing system and substrate processing method

TOKYO ELECTRON LTD2 citations72
US7615251B2Nov 10, 2009

Processing device using shower head structure and processing method

TOKYO ELECTRON LTD3 citations62
US6407010B1Jun 18, 2002

Single-substrate-heat-processing apparatus and method for semiconductor process

TOKYO ELECTRON LTD4 citations62
US12482663B2Nov 25, 2025

Processing apparatus

TOKYO ELECTRON LTD0 citations61
US9920422B2Mar 20, 2018

Method and apparatus of forming silicon nitride film

TOKYO ELECTRON LTD0 citations52
US9777366B2Oct 3, 2017

Thin film forming method

TOKYO ELECTRON LTD1 citations52
US9490122B2Nov 8, 2016

Method and apparatus of forming carbon-containing silicon film

TOKYO ELECTRON LTD0 citations52
US9425073B2Aug 23, 2016

Depression filling method and processing apparatus

TOKYO ELECTRON LTD1 citations52
US9190271B2Nov 17, 2015

Thin film formation method

TOKYO ELECTRON LTD0 citations52
US9145604B2Sep 29, 2015

Thin film forming method and film forming apparatus

TOKYO ELECTRON LTD1 citations52
US9123782B2Sep 1, 2015

Amorphous silicon film formation method and amorphous silicon film formation apparatus

TOKYO ELECTRON LTD0 citations52
US8815714B2Aug 26, 2014

Method of forming a germanium thin film

TOKYO ELECTRON LTD0 citations52
US8361550B2Jan 29, 2013

Method for forming SrTiO3 film and storage medium

TOKYO ELECTRON LTD1 citations52
US12538504B2Jan 27, 2026

Film formation method

TOKYO ELECTRON LTD0 citations46
US9353442B2May 31, 2016

Apparatus for forming silicon-containing thin film

TOKYO ELECTRON LTD0 citations42
US9318328B2Apr 19, 2016

Method and apparatus for forming silicon film

TOKYO ELECTRON LTD0 citations41
US7816282B2Oct 19, 2010

Method for forming SrTiO3 film

TOKYO ELECTRON LTD0 citations41
US9646879B2May 9, 2017

Depression filling method and processing apparatus

TOKYO ELECTRON LTD0 citations39

KAKIMOTO AKINOBU

5 patents

HASEBE KAZUHIDE

2 patents

TAMURA AKITAKE

1 patent

KAWANO YUMIKO

1 patent