P

Inventor

WRENCH JACQUELINE S

US24 patents

Patents

24 patents
US12022650B2Jun 25, 2024

Low resistivity DRAM buried word line stack

APPLIED MATERIALS INC2 citations72
US11587936B2Feb 21, 2023

Low resistivity DRAM buried word line stack

APPLIED MATERIALS INC2 citations72
US11245022B2Feb 8, 2022

Integrated dipole flow for transistor

APPLIED MATERIALS INC2 citations72
US12453086B2Oct 21, 2025

Low resistivity metal contact stack

APPLIED MATERIALS INC0 citations62
US12230688B2Feb 18, 2025

MOSFET gate engineerinng with dipole films

APPLIED MATERIALS INC0 citations62
US12051734B2Jul 30, 2024

PMOS high-k metal gates

APPLIED MATERIALS INC0 citations62
US11894233B2Feb 6, 2024

Electronic device having an oxygen free platinum group metal film

APPLIED MATERIALS INC0 citations62
US11869806B2Jan 9, 2024

Methods of forming molybdenum contacts

APPLIED MATERIALS INC0 citations62
US11552177B2Jan 10, 2023

PMOS high-K metal gates

APPLIED MATERIALS INC0 citations62
US11488830B2Nov 1, 2022

Oxygen free deposition of platinum group metal films

APPLIED MATERIALS INC0 citations62
US11359282B2Jun 14, 2022

Methods for forming impurity free metal alloy films

APPLIED MATERIALS INC1 citations62
US11171047B2Nov 9, 2021

Fluorine-doped nitride films for improved high-k reliability

APPLIED MATERIALS INC0 citations62
US12328872B2Jun 10, 2025

Liner for V-NAND word line stack

APPLIED MATERIALS INC0 citations61
US12100595B2Sep 24, 2024

Amorphous silicon-based scavenging and sealing EOT

APPLIED MATERIALS INC0 citations61
US11997849B2May 28, 2024

V-NAND stacks with dipole regions

APPLIED MATERIALS INC0 citations61
US11888045B2Jan 30, 2024

Integrated dipole flow for transistor

APPLIED MATERIALS INC0 citations61
US11776980B2Oct 3, 2023

Methods for reflector film growth

APPLIED MATERIALS INC0 citations61
US11476267B2Oct 18, 2022

Liner for V-NAND word line stack

APPLIED MATERIALS INC0 citations61
US12104243B2Oct 1, 2024

Methods and apparatus for processing a substrate

APPLIED MATERIALS INC0 citations60
US11908914B2Feb 20, 2024

Methods of forming semiconductor structures

APPLIED MATERIALS INC0 citations60
US10991586B2Apr 27, 2021

In-situ tungsten deposition without barrier layer

APPLIED MATERIALS INC0 citations60
US12438044B2Oct 7, 2025

Methods and apparatus for seam reduction or elimination

APPLIED MATERIALS INC0 citations51
US12114488B2Oct 8, 2024

Enhancing gapfill performance of dram word line

APPLIED MATERIALS INC0 citations51
US10559578B2Feb 11, 2020

Deposition of cobalt films with high deposition rate

APPLIED MATERIALS INC0 citations50