Inventor
TANG WEI V
US20 patents
Patents
20 patentsUS10014185B1Jul 3, 2018
Selective etch of metal nitride films
APPLIED MATERIALS INC22 citations92
US11715667B2Aug 1, 2023
Thermal process chamber lid with backside pumping
APPLIED MATERIALS INC5 citations85
US10407771B2Sep 10, 2019
Atomic layer deposition chamber with thermal lid
APPLIED MATERIALS INC12 citations81
US9748354B2Aug 29, 2017
Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof
APPLIED MATERIALS INC5 citations73
US11335591B2May 17, 2022
Thermal process chamber lid with backside pumping
APPLIED MATERIALS INC2 citations72
US9947578B2Apr 17, 2018
Methods for forming low-resistance contacts through integrated process flow systems
APPLIED MATERIALS INC2 citations72
US12387975B2Aug 12, 2025
Thermal process chamber lid with backside pumping
APPLIED MATERIALS INC0 citations62
US11894233B2Feb 6, 2024
Electronic device having an oxygen free platinum group metal film
APPLIED MATERIALS INC0 citations62
US11488830B2Nov 1, 2022
Oxygen free deposition of platinum group metal films
APPLIED MATERIALS INC0 citations62
US11171047B2Nov 9, 2021
Fluorine-doped nitride films for improved high-k reliability
APPLIED MATERIALS INC0 citations62
US12328872B2Jun 10, 2025
Liner for V-NAND word line stack
APPLIED MATERIALS INC0 citations61
US11732358B2Aug 22, 2023
High temperature chemical vapor deposition lid
APPLIED MATERIALS INC0 citations61
US11623253B2Apr 11, 2023
In-situ DC plasma for cleaning pedestal heater
APPLIED MATERIALS INC0 citations61
US11476267B2Oct 18, 2022
Liner for V-NAND word line stack
APPLIED MATERIALS INC0 citations61
US11447866B2Sep 20, 2022
High temperature chemical vapor deposition lid
APPLIED MATERIALS INC0 citations61
US11260432B2Mar 1, 2022
In-situ DC plasma for cleaning pedestal heater
APPLIED MATERIALS INC0 citations61
US10991586B2Apr 27, 2021
In-situ tungsten deposition without barrier layer
APPLIED MATERIALS INC0 citations60
US10170321B2Jan 1, 2019
Aluminum content control of TiAIN films
APPLIED MATERIALS INC1 citations60
US10665450B2May 26, 2020
Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum films
APPLIED MATERIALS INC0 citations52
US10755947B2Aug 25, 2020
Methods of increasing selectivity for selective etch processes
APPLIED MATERIALS INC0 citations50