Inventor
LEE ZHI-CHENG
TW33 patents
⚠️ This page may combine multiple inventors who share the name “LEE ZHI-CHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNITED MICROELECTRONICS CORP
25 patentsUS11239327B2Feb 1, 2022
HEMT and method of adjusting electron density of 2DEG
UNITED MICROELECTRONICS CORP18 citations85
US11088271B2Aug 10, 2021
High electron mobility transistor and method for fabricating the same
UNITED MICROELECTRONICS CORP6 citations84
US8003461B1Aug 23, 2011
Method of fabricating efuse structure, resistor sturcture and transistor sturcture
UNITED MICROELECTRONICS CORP7 citations84
US11749748B2Sep 5, 2023
High electron mobility transistor and method for fabricating the same
UNITED MICROELECTRONICS CORP2 citations73
US10629728B1Apr 21, 2020
Semiconductor device and fabrication method thereof
UNITED MICROELECTRONICS CORP3 citations73
US10566244B2Feb 18, 2020
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP3 citations73
US9640661B1May 2, 2017
FinFET having a fin and a V-shaped epitaxial layer formed on the top surface of the fin and method for fabricating the same
UNITED MICROELECTRONICS CORP2 citations73
US11380777B2Jul 5, 2022
Method for forming a high-voltage metal-oxide-semiconductor transistor device
UNITED MICROELECTRONICS CORP2 citations72
US10103265B1Oct 16, 2018
Complementary metal oxide semiconductor device and method of forming the same
UNITED MICROELECTRONICS CORP5 citations67
US12396195B2Aug 19, 2025
High electron mobility transistor device and manufacturing method thereof
UNITED MICROELECTRONICS CORP1 citations62
US12132095B2Oct 29, 2024
Method of fabricating metal gate transistor
UNITED MICROELECTRONICS CORP0 citations62
US12107157B2Oct 1, 2024
High electron mobility transistor and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US11715784B2Aug 1, 2023
Method for forming a high-voltage metal-oxide-semiconductor transistor device
UNITED MICROELECTRONICS CORP0 citations62
US11652154B2May 16, 2023
Method of fabricating metal gate transistor
UNITED MICROELECTRONICS CORP0 citations62
US11610973B2Mar 21, 2023
High voltage transistor structure and method of fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US11527652B2Dec 13, 2022
Semiconductor process
UNITED MICROELECTRONICS CORP0 citations62
US11251279B2Feb 15, 2022
High voltage transistor structure and method of fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US11127838B2Sep 21, 2021
Method of fabricating metal gate transistor
UNITED MICROELECTRONICS CORP0 citations62
US11011430B2May 18, 2021
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US12107121B2Oct 1, 2024
Method for forming air gap between gate dielectric layer and spacer
UNITED MICROELECTRONICS CORP0 citations60
US10861974B2Dec 8, 2020
Semiconductor structure and process thereof
UNITED MICROELECTRONICS CORP0 citations52
US10756209B2Aug 25, 2020
Semiconductor device
UNITED MICROELECTRONICS CORP0 citations52
US10014406B2Jul 3, 2018
Semiconductor device and method of forming the same
UNITED MICROELECTRONICS CORP1 citations52
US10629734B2Apr 21, 2020
Fabricating method of fin structure with tensile stress and complementary FinFET structure
UNITED MICROELECTRONICS CORP0 citations45
US10229995B2Mar 12, 2019
Fabricating method of fin structure with tensile stress and complementary FinFET structure
UNITED MICROELECTRONICS CORP0 citations45
HSU CHE-HUA
4 patentsUS8268712B2Sep 18, 2012
Method of forming metal gate structure and method of forming metal gate transistor
HSU CHE-HUA2 citations60
US8232152B2Jul 31, 2012
Removing method of a hard mask
HSU CHE-HUA2 citations58
US8492259B2Jul 23, 2013
Method of forming metal gate structure
HSU CHE-HUA0 citations50
US8486842B2Jul 16, 2013
Method of selectively removing patterned hard mask
HSU CHE-HUA0 citations50