P

Inventor

HOSONO KUNIHIRO

JP15 patents
⚠️ This page may combine multiple inventors who share the name “HOSONO KUNIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MITSUBISHI ELECTRIC CORP

13 patents
US5093572AMar 3, 1992

Scanning electron microscope for observation of cross section and method of observing cross section employing the same

MITSUBISHI ELECTRIC CORP94 citations95
US5464713ANov 7, 1995

Phase shift mask and method for repairing a defect of a phase shift mask

MITSUBISHI ELECTRIC CORP20 citations92
US5382484AJan 17, 1995

Method of correcting defects in the pattern of phase shift mask

MITSUBISHI ELECTRIC CORP39 citations92
US5272116ADec 21, 1993

Method for pattern defect correction of a photomask

MITSUBISHI ELECTRIC CORP26 citations92
US5085957AFeb 4, 1992

Method of repairing a mask

MITSUBISHI ELECTRIC CORP31 citations92
US4887283ADec 12, 1989

X-ray mask and exposure method employing the same

MITSUBISHI ELECTRIC CORP28 citations92
US6340543B1Jan 22, 2002

Photomask, manufacturing method thereof, and semiconductor device

MITSUBISHI ELECTRIC CORP49 citations90
US5767974AJun 16, 1998

Apparatus and method for identifying photomask pattern defects

MITSUBISHI ELECTRIC CORP41 citations89
US6620557B1Sep 16, 2003

Photo-mask, photo-mask pair, semiconductor device and method of manufacturing a semiconductor device

MITSUBISHI ELECTRIC CORP18 citations83
US6503852B2Jan 7, 2003

Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device

MITSUBISHI ELECTRIC CORP7 citations73
US6433437B1Aug 13, 2002

Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device

MITSUBISHI ELECTRIC CORP2 citations62
US6537709B2Mar 25, 2003

Photo mask having film formed from halftone material, method of manufacturing photo mask, and method of manufacturing semiconductor device

MITSUBISHI ELECTRIC CORP0 citations49
US6338923B1Jan 15, 2002

Photolithography mask having monitoring marks and manufacturing method thereof

MITSUBISHI ELECTRIC CORP0 citations48

RENESAS TECH CORP

2 patents