Inventor

HONG EUNKEE

KR20 patents

⚠️ This page may combine multiple inventors who share the name “HONG EUNKEE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HONG EUNKEE

SAMSUNG ELECTRONICS CO LTD

Compositions including perhydro-polysilazane used in a semiconductor manufacturing process and methods of manufacturing semiconductor devices using the same

Method of forming a trench isolation layer and method of manufacturing a non-volatile memory device using the same

Semiconductor memory devices including support patterns

Methods of forming spin-on-glass insulating layers in semiconductor devices and associated semiconductor device

Methods of forming trench isolation layers using high density plasma chemical vapor deposition

Methods of fabricating flash memory devices comprising forming a silicide on exposed upper and side surfaces of a control gate

Method of filling a trench and method of forming an isolating layer structure using the same

Compositions including perhydro-polysilazane used in a semiconductor manufacturing process and methods of manufacturing semiconductor devices using the same

Method of fabricating semiconductor device

Methods of forming semiconductor devices having multilayer isolation structures

Method of fabricating a semiconductor microstructure

BYUN KYUNGMUN

Methods of fabricating semiconductor memory devices including support patterns

Semiconductor devices and methods of fabricating the same

KIM HONGGUN

Methods of fabricating a semiconductor device comprising a conformal interfacial layer

Semiconductor device and method of fabricating the same

KIM HYONGSOO

Semiconductor memory devices and methods of fabricating the same

HAN KYU-HEE

Integrated circuit devices having selectively strengthened composite interlayer insulation layers and methods of fabricating the same

NAM SANG-DON

Method of fabricating semiconductor device

OH KYUNG-SEOK

Oxidation-promoting compositions, methods of forming oxide layers, and methods of fabricating semiconductor devices

CHOI JONG-WAN

Methods of manufacturing flash memory devices by selective removal of nitrogen atoms