Inventor

KIM RYOUNG-HAN

US21 patents

⚠️ This page may combine multiple inventors who share the name “KIM RYOUNG-HAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KIM RYOUNG-HAN

GLOBALFOUNDRIES INC

EUV pellicle and method for fabricating semiconductor dies using same

EUV pellicle with increased EUV light transmittance

Inverse self-aligned spacer lithography

EUV debris mitigation filter and method for fabricating semiconductor dies using same

Stabilization of deep ultraviolet photoresist

Multiple exposure technique using OPC to correct distortion

In-die focus monitoring with binary mask

KIM RYOUNG-HAN

Multilayer interconnect structure and method for integrated circuits

Spacer double patterning that prints multiple CD in front-end-of-line

Method for forming an interconnect structure

Methods for fabricating semiconductor devices

Method of forming semiconductor device

Spacer lithography

Double exposure technology using high etching selectivity

TEXAS INSTRUMENTS INC

Method of printing multiple structure widths using spacer double patterning

Integration of finFET device

TESSERA ADVANCED TECH INC

Multilayer interconnect structure and method for integrated circuits

OKOROANYANWU UZODINMA

Method for forming a high resolution resist pattern on a semiconductor wafer

LAFONTAINE BRUNO M

Optical polarizer with nanotube array

ADVANCED MICRO DEVICES INC

Double exposure technology using high etching selectivity

WALLOW THOMAS INGOLF

Method of forming semiconductor device with multiple level patterning