P

Inventor

MANGER MATTHIAS

DE27 patents
⚠️ This page may combine multiple inventors who share the name “MANGER MATTHIAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ZEISS CARL SMT GMBH

17 patents
US10514608B2Dec 24, 2019

Method for producing an illumination system for an EUV projection exposure system, and illumination system

ZEISS CARL SMT GMBH4 citations68
US11274914B2Mar 15, 2022

Measuring assembly for the frequency-based determination of the position of a component

ZEISS CARL SMT GMBH3 citations65
US11415892B2Aug 16, 2022

Method for producing a reflecting optical element of a projection exposure apparatus and reflecting optical element for a projection exposure apparatus, projection lens and projection exposure apparatus

ZEISS CARL SMT GMBH2 citations63
US11099400B2Aug 24, 2021

Beam propagation camera and method for light beam analysis

ZEISS CARL SMT GMBH1 citations62
US8786849B2Jul 22, 2014

Method for measuring an optical system

ZEISS CARL SMT GMBH2 citations61
US11054305B2Jul 6, 2021

Method and device for beam analysis

ZEISS CARL SMT GMBH1 citations60
US10605654B2Mar 31, 2020

Method and device for beam analysis

ZEISS CARL SMT GMBH1 citations60
US11920977B2Mar 5, 2024

Metrology system and method for measuring an excitation laser beam in an EUV plasma source

ZEISS CARL SMT GMBH0 citations58
US11737199B2Aug 22, 2023

Device and method for measuring the beam angle of a light beam guided by a beam guiding optical unit

ZEISS CARL SMT GMBH0 citations58
US11048172B2Jun 29, 2021

Method for producing an illumination system for an EUV projection exposure system, and illumination system

ZEISS CARL SMT GMBH0 citations58
US12372877B2Jul 29, 2025

Projection exposure apparatus for semiconductor lithography

ZEISS CARL SMT GMBH0 citations54
US12130557B2Oct 29, 2024

Optical system and lithography apparatus

ZEISS CARL SMT GMBH0 citations51
US12443110B2Oct 14, 2025

Optical assembly, method for controlling an optical assembly, and projection exposure apparatus

ZEISS CARL SMT GMBH0 citations48
US12276916B2Apr 15, 2025

Drive device, optical system and lithography apparatus

ZEISS CARL SMT GMBH0 citations48
US9823119B2Nov 21, 2017

System and method for analyzing a light beam guided by a beam guiding optical unit

ZEISS CARL SMT GMBH1 citations48
US9720328B2Aug 1, 2017

Projection exposure system for microlithography and method of monitoring a lateral imaging stability

ZEISS CARL SMT GMBH0 citations48
US12578654B2Mar 17, 2026

Method for calibrating a manipulable optical module

ZEISS CARL SMT GMBH0 citations43

ZEISS CARL SMT AG

3 patents

SIEMENS AG

2 patents

FREIMANN ROLF

1 patent

SCHELLHORN UWE

1 patent

HUEBEL ALEXANDER

1 patent

MANGER MATTHIAS

1 patent

KRAEHMER DANIEL

1 patent