Method for producing a reflecting optical element of a projection exposure apparatus and reflecting optical element for a projection exposure apparatus, projection lens and projection exposure apparatus

Abstract

A method for producing a reflecting optical element for a projection exposure apparatus (1). The element has a substrate (30) with a substrate surface (31), a protection layer (38) and a layer partial system (39) suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (31), (b) irradiating the substrate (30) with electrons (36), and (c) tempering the substrate (30). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror (18, 19, 20) as reflective optical element, and a projection exposure apparatus (1) including such a projection lens.

What is claimed is: 
     
       1. Method for producing a reflecting optical element for a projection exposure apparatus, which comprises a substrate with a substrate surface, a protection layer and a layer partial system suited for an extreme ultraviolet (EUV) wavelength range, comprising:
 a) measuring the substrate surface, 
 b) compacting the substrate by irradiating the substrate with electrons, and 
 c) tempering the substrate after said compacting. 
 
     
     
       2. Method according to  claim 1 ,
 wherein said tempering comprises: 
 using tempering temperatures of between 22° C. and 400° C. 
 
     
     
       3. Method according to  claim 1 ,
 wherein said tempering comprises: 
 holding the tempering temperature over a duration of 1 h to 1000 h. 
 
     
     
       4. Method according to  claim 1 ,
 wherein said tempering comprises: 
 varying the tempering temperature over time. 
 
     
     
       5. Method according to  claim 1 ,
 wherein said tempering comprises: 
 heating the substrate homogeneously. 
 
     
     
       6. Method according to  claim 1 ,
 wherein said tempering comprises: 
 localized heating of the substrate. 
 
     
     
       7. Method for producing a reflecting optical element for a projection exposure apparatus, which comprises a substrate with a substrate surface, a protection layer and a layer partial system suited for an extreme ultraviolet (EUV) wavelength range, comprising:
 a) measuring the substrate surface, 
 b) irradiating the substrate with electrons, and 
 c) tempering the substrate, 
 wherein said tempering comprises: 
 introducing the tempering temperature into the substrate by irradiation with a laser with a wavelength of 2.6 μm to 2.8 μm. 
 
     
     
       8. Method according to  claim 7 ,
 wherein the wavelength is 2.755 μm. 
 
     
     
       9. Method for producing a reflecting optical element for a projection exposure apparatus, which comprises a substrate with a substrate surface, a protection layer and a layer partial system suited for an extreme ultraviolet (EUV) wavelength range, comprising:
 a) measuring the substrate surface, 
 b) irradiating the substrate with electrons, and 
 c) tempering the substrate, 
 wherein said irradiating comprises: 
 adjusting a set-point change in the substrate from said tempering in said irradiating of the substrate.