Inventor · disambiguated record
Matthias Manger
Also filed as: MANGER MATTHIAS
26 granted patents·20 pending applications·48 citations·filing 2004–2025
94Inventor score
Top patents by PatentIndex Score
46 records- 0187US10514608B2Method for producing an illumination system for an EUV projection exposure system, and illumination systemZEISS CARL SMT GMBH·Filed 2018·Granted Dec 24, 2019·4 cites·25 claims
- 0286US11274914B2Measuring assembly for the frequency-based determination of the position of a componentZEISS CARL SMT GMBH·Filed 2020·Granted Mar 15, 2022·3 cites·22 claims
- 0383US11415892B2Method for producing a reflecting optical element of a projection exposure apparatus and reflecting optical element for a projection exposure apparatus, projection lens and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2021·Granted Aug 16, 2022·2 cites·9 claims
- 0482US2025390024A1Adaptive optical module for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 0578US7755748B2Device and method for range-resolved determination of scattered light, and an illumination maskZEISS CARL SMT AG·Filed 2008·Granted Jul 13, 2010·4 cites·26 claims
- 0674US11054305B2Method and device for beam analysisZEISS CARL SMT GMBH·Filed 2019·Granted Jul 6, 2021·1 cites·22 claims
- 0772US8786849B2Method for measuring an optical systemZEISS CARL SMT GMBH·Filed 2013·Granted Jul 22, 2014·2 cites·31 claims
- 0869US10605654B2Method and device for beam analysisZEISS CARL SMT GMBH·Filed 2018·Granted Mar 31, 2020·1 cites·17 claims
- 0969US9235142B2Projection exposure system for microlithography and method of monitoring a lateral imaging stabilityMANGER MATTHIAS·Filed 2010·Granted Jan 12, 2016·2 cites·22 claims
- 1069US7408631B2Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field maskZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·9 cites·25 claims
- 1168US8473237B2Method for calibrating a specimen stage of a metrology system and metrology system comprising a specimen stageHUEBEL ALEXANDER·Filed 2010·Granted Jun 25, 2013·4 cites·28 claims
- 1267US11099400B2Beam propagation camera and method for light beam analysisZEISS CARL SMT GMBH·Filed 2016·Granted Aug 24, 2021·1 cites·20 claims
- 1367US2025216794A1Mirror device, for example for a microlithographic projection exposure system, and method for measuring the temperature of a mirrorZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1467US2025216801A1Mirror device, projection objective and method for measuring the temperature of a mirrorZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1566US12372877B2Projection exposure apparatus for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2023·Granted Jul 29, 2025·0 cites·20 claims
- 1666US9823119B2System and method for analyzing a light beam guided by a beam guiding optical unitZEISS CARL SMT GMBH·Filed 2016·Granted Nov 21, 2017·1 cites·17 claims
- 1765US2025130504A1Optical element and projection exposure apparatus for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1864US2025334890A1Module for a projection exposure apparatus, method, and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1963US8593642B2Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring deviceFREIMANN ROLF·Filed 2012·Granted Nov 26, 2013·2 cites·13 claims
- 2062US12130557B2Optical system and lithography apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Oct 29, 2024·0 cites·31 claims
- 2161US2023229091A1Adaptive optical element for microlithographyZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2260US12276916B2Drive device, optical system and lithography apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Apr 15, 2025·0 cites·20 claims
- 2360US2025110413A1Method for compensating actuator effects of actuatorsZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2460US2023229092A1Adaptive optical element for microlithographyZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2559US11048172B2Method for producing an illumination system for an EUV projection exposure system, and illumination systemZEISS CARL SMT GMBH·Filed 2019·Granted Jun 29, 2021·0 cites·22 claims
- 2659US2024085783A1Optical device, method for adjusting a setpoint deformation and lithography systemZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2759US2024103381A1Optical apparatus, method for setting a target deformation, and lithography systemZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 2856US8416412B2Method for determination of residual errorsSCHELLHORN UWE·Filed 2007·Granted Apr 9, 2013·4 cites·21 claims
- 2956US7760345B2Method and apparatus for determining at least one optical property of an imaging optical systemZEISS CARL SMT AG·Filed 2007·Granted Jul 20, 2010·1 cites·31 claims
- 3055US2024085800A1Projection exposure apparatus and method for designing a component of a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 3154US9720328B2Projection exposure system for microlithography and method of monitoring a lateral imaging stabilityZEISS CARL SMT GMBH·Filed 2016·Granted Aug 1, 2017·0 cites·11 claims
- 3253US12443110B2Optical assembly, method for controlling an optical assembly, and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2023·Granted Oct 14, 2025·0 cites·20 claims
- 3353US2018039184A1Projection exposure system for microlithography and method of monitoring a lateral imaging stabilityZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 3452US11920977B2Metrology system and method for measuring an excitation laser beam in an EUV plasma sourceZEISS CARL SMT GMBH·Filed 2021·Granted Mar 5, 2024·0 cites·17 claims
- 3552US11737199B2Device and method for measuring the beam angle of a light beam guided by a beam guiding optical unitZEISS CARL SMT GMBH·Filed 2021·Granted Aug 22, 2023·0 cites·20 claims
- 3652US2023359191A1System and method for determining a cause of an operating anomaly of a machine, computer program and electronically readable data storage deviceSIEMENS AG·Filed 2021·Application pending·0 cites
- 3752US2022368104A1Control device, control system, method for operating a control systemZEISS CARL SMT GMBH·Filed 2022·Application pending·0 cites
- 3852US2023228798A1Method and device for measuring actuators in a projection exposure apparatus for semiconductor lithographyZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 3949US2014078513A1Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring deviceZEISS CARL SMT GMBH·Filed 2013·Application pending·0 cites
- 4047USD914612SElectrical junction box for motor diagnosisSIEMENS AG·Filed 2018·Granted Mar 30, 2021·4 cites·1 claims
- 4147US2022327240A1Method for securing asset maintenance information and asset having a lifecycle blockchain nodeSIEMENS AG·Filed 2022·Application pending·0 cites
- 4246US2023303088A1Determining a load of a drive deviceSIEMENS AG·Filed 2021·Application pending·0 cites
- 4345US2010153059A1Apparatus and method for measuring the positions of marks on a maskKLOSE GERD·Filed 2008·Application pending·0 cites
- 4443US8456616B2Optical system for microlithographyKRAEHMER DANIEL·Filed 2009·Granted Jun 4, 2013·0 cites·20 claims
- 4542USD863226SElectrical junction box for motor diagnosisSIEMENS AG·Filed 2017·Granted Oct 15, 2019·3 cites·1 claims
- 4636US2016350935A1Measuring arrangement for use when determining trajectories of flying objectsZEISS CARL SMT GMBH·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →