P

Inventor

PADMANABAN MUNIRATHNA

US41 patents
⚠️ This page may combine multiple inventors who share the name “PADMANABAN MUNIRATHNA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CLARIANT FINANCE BVI LTD

10 patents
US6447980B1Sep 10, 2002

Photoresist composition for deep UV and process thereof

CLARIANT FINANCE BVI LTD144 citations99
US6723488B2Apr 20, 2004

Photoresist composition for deep UV radiation containing an additive

CLARIANT FINANCE BVI LTD99 citations98
US6803168B1Oct 12, 2004

Composition for anti-reflective coating or radiation absorbing coating and compounds used in the composition

CLARIANT FINANCE BVI LTD55 citations96
US6114085ASep 5, 2000

Antireflective composition for a deep ultraviolet photoresist

CLARIANT FINANCE BVI LTD112 citations96
US6365322B1Apr 2, 2002

Photoresist composition for deep UV radiation

CLARIANT FINANCE BVI LTD34 citations93
US6737492B2May 18, 2004

Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating

CLARIANT FINANCE BVI LTD28 citations92
US6610465B2Aug 26, 2003

Process for producing film forming resins for photoresist compositions

CLARIANT FINANCE BVI LTD23 citations92
US6277750B1Aug 21, 2001

Composition for bottom reflection preventive film and novel polymeric dye for use in the same

CLARIANT FINANCE BVI LTD48 citations92
US6468718B1Oct 22, 2002

Radiation absorbing polymer, composition for radiation absorbing coating, radiation absorbing coating and application thereof as anti-reflective coating

CLARIANT FINANCE BVI LTD14 citations84
US6800416B2Oct 5, 2004

Negative deep ultraviolet photoresist

CLARIANT FINANCE BVI LTD9 citations72

AZ ELECTRONIC MATERIALS USA

8 patents
US6991888B2Jan 31, 2006

Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds

AZ ELECTRONIC MATERIALS USA84 citations98
US7678528B2Mar 16, 2010

Photoactive compounds

AZ ELECTRONIC MATERIALS USA34 citations93
US7595141B2Sep 29, 2009

Composition for coating over a photoresist pattern

AZ ELECTRONIC MATERIALS USA46 citations92
US7521170B2Apr 21, 2009

Photoactive compounds

AZ ELECTRONIC MATERIALS USA21 citations91
US7122291B2Oct 17, 2006

Photoresist compositions

AZ ELECTRONIC MATERIALS USA15 citations81
US7491482B2Feb 17, 2009

Photoactive compounds

AZ ELECTRONIC MATERIALS USA7 citations63
US7537879B2May 26, 2009

Photoresist composition for deep UV and process thereof

AZ ELECTRONIC MATERIALS USA3 citations62
US7833693B2Nov 16, 2010

Photoactive compounds

AZ ELECTRONIC MATERIALS USA1 citations51

HOECHST JAPAN

8 patents
US5663035ASep 2, 1997

Radiation-sensitive mixture comprising a basic iodonium compound

HOECHST JAPAN57 citations95
US5525453AJun 11, 1996

Positive-working radiation-sensitive mixture

HOECHST JAPAN61 citations94
US5738972AApr 14, 1998

Radiation sensitive composition

HOECHST JAPAN21 citations92
US5595855AJan 21, 1997

Radiation sensitive composition

HOECHST JAPAN24 citations92
US5846690ADec 8, 1998

Radiation-sensitive composition containing plasticizer

HOECHST JAPAN11 citations73
US5843319ADec 1, 1998

Positive-working radiation-sensitive mixture

HOECHST JAPAN16 citations73
US5773191AJun 30, 1998

Radiation-sensitive composition

HOECHST JAPAN11 citations73
US5641594AJun 24, 1997

Colored, photosensitive resin composition

HOECHST JAPAN5 citations61

PADMANABAN MUNIRATHNA

2 patents
US8632948B2Jan 21, 2014

Positive-working photoimageable bottom antireflective coating

PADMANABAN MUNIRATHNA9 citations81
US8796398B2Aug 5, 2014

Superfine pattern mask, method for production thereof, and method employing the same for forming superfine pattern

PADMANABAN MUNIRATHNA0 citations38

YAO HUIRONG

2 patents
US9315636B2Apr 19, 2016

Stable metal compounds, their compositions and methods

YAO HUIRONG6 citations71
US9296922B2Mar 29, 2016

Stable metal compounds as hardmasks and filling materials, their compositions and methods of use

YAO HUIRONG5 citations71

NAKASUGI SHIGEMASA

2 patents
US8900797B2Dec 2, 2014

Developable bottom anti-reflective coating

NAKASUGI SHIGEMASA4 citations69
US8697336B2Apr 15, 2014

Composition for forming a developable bottom antireflective coating

NAKASUGI SHIGEMASA2 citations58

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L

2 patents
US9409793B2Aug 9, 2016

Spin coatable metallic hard mask compositions and processes thereof

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L2 citations60
US9418836B2Aug 16, 2016

Polyoxometalate and heteropolyoxometalate compositions and methods for their use

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L0 citations50

CLARIANT INT LTD

1 patent
US6329117B1Dec 11, 2001

Antireflection or light-absorbing coating composition and polymer therefor

CLARIANT INT LTD60 citations96

CLARIANT AG

1 patent
US5852128ADec 22, 1998

Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials

CLARIANT AG31 citations90

AZ ELECTRONIC MATERIALS LUXEMBOURG SARL

1 patent
US9274426B2Mar 1, 2016

Antireflective coating compositions and processes thereof

AZ ELECTRONIC MATERIALS LUXEMBOURG SARL12 citations81

KUDO TAKANORI

1 patent
US8623589B2Jan 7, 2014

Bottom antireflective coating compositions and processes thereof

KUDO TAKANORI5 citations66

MERCK PATENT GMBH

1 patent
US11031237B2Jun 8, 2021

Aromatic amino siloxane functionalized materials for use in capping porous dielectrics

MERCK PATENT GMBH0 citations58

RIDGEFIELD ACQUISITION

1 patent
US11421128B2Aug 23, 2022

Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer

RIDGEFIELD ACQUISITION0 citations49

CHAKRAPANI SRINIVASAN

1 patent
US8252503B2Aug 28, 2012

Photoresist compositions

CHAKRAPANI SRINIVASAN0 citations32