Inventor
NAKANO HAJIME
JP29 patents
⚠️ This page may combine multiple inventors who share the name “NAKANO HAJIME”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
14 patentsUS7968205B2Jun 28, 2011
Corrosion resistant multilayer member
SHINETSU CHEMICAL CO44 citations94
US7655328B2Feb 2, 2010
Conductive, plasma-resistant member
SHINETSU CHEMICAL CO24 citations89
US7462407B2Dec 9, 2008
Fluoride-containing coating and coated member
SHINETSU CHEMICAL CO18 citations83
US10968507B2Apr 6, 2021
Sprayed coating, method for manufacturing sprayed coating, sprayed member and spraying material
SHINETSU CHEMICAL CO3 citations72
US6387148B1May 14, 2002
Hydrogen absorbing alloy compact for use as the negative electrode of an alkaline rechargeable battery
SHINETSU CHEMICAL CO9 citations72
US12428716B2Sep 30, 2025
Sprayed coating, method for manufacturing sprayed coating, sprayed member and spraying material
SHINETSU CHEMICAL CO0 citations62
US12043903B2Jul 23, 2024
Sprayed coating, method for manufacturing sprayed coating, sprayed member and spraying material
SHINETSU CHEMICAL CO0 citations62
US12577647B2Mar 17, 2026
Film-forming material, film-forming slurry, spray coated film, and spray coated member
SHINETSU CHEMICAL CO0 citations59
US7674427B2Mar 9, 2010
Rare earth metal member and making method
SHINETSU CHEMICAL CO0 citations52
US9472731B2Oct 18, 2016
Phosphor-containing resin molded body, light emitting device, and resin pellet
SHINETSU CHEMICAL CO1 citations51
US6300010B1Oct 9, 2001
Hydrogen absorbing alloy powder for use in the negative electrodes of alkaline rechargeable batteries and process for producing the same
SHINETSU CHEMICAL CO1 citations51
US7816013B2Oct 19, 2010
Wafer
SHINETSU CHEMICAL CO0 citations50
US10266763B2Apr 23, 2019
Mn-activated complex fluoride phosphor and method of producing thereof
SHINETSU CHEMICAL CO0 citations48
US10450505B2Oct 22, 2019
Wavelength conversion member and light-emitting device
SHINETSU CHEMICAL CO0 citations41
HITACHI CHEM DUPONT MICROSYS
5 patentsUS7435525B2Oct 14, 2008
Positive photosensitive resin composition, method for forming pattern, and electronic part
HITACHI CHEM DUPONT MICROSYS22 citations91
US7150947B2Dec 19, 2006
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
HITACHI CHEM DUPONT MICROSYS12 citations82
US7932012B2Apr 26, 2011
Heat-resistant photosensitive resin composition, method for forming pattern using the composition, and electronic part
HITACHI CHEM DUPONT MICROSYS10 citations81
US7638254B2Dec 29, 2009
Positive photosensitive resin composition, method for forming pattern, and electronic part
HITACHI CHEM DUPONT MICROSYS4 citations61
US7851128B2Dec 14, 2010
Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
HITACHI CHEM DUPONT MICROSYS3 citations60
NIHON MEDIPHYSICS CO LTD
2 patentsNAKANO HAJIME
2 patentsUS8097386B2Jan 17, 2012
Positive-type photosensitive resin composition, method for producing patterns, and electronic parts
NAKANO HAJIME6 citations64
US8765868B2Jul 1, 2014
Resin composition for insulating film or surface-protective film of electronic components, method for producing pattern-cured film and electronic components
NAKANO HAJIME0 citations38